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Keywords = bipolar resistive switching characteristics

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11 pages, 1677 KiB  
Article
A Novel Darlington Structure Power Switch Using a Vacuum Field Emission Transistor
by Yulong Ding, Yanlin Ke, Juncong She, Yu Zhang and Shaozhi Deng
Electronics 2025, 14(9), 1737; https://doi.org/10.3390/electronics14091737 - 24 Apr 2025
Viewed by 379
Abstract
This study proposes a power switch combining a vacuum field emission transistor (VFET) as a controlled transistor with a power bipolar Darlington transistor (DT) as an output transistor, termed the VFET–DT structure. Compared to the MOS–bipolar Darlington power switch, the VFET–DT structure achieves [...] Read more.
This study proposes a power switch combining a vacuum field emission transistor (VFET) as a controlled transistor with a power bipolar Darlington transistor (DT) as an output transistor, termed the VFET–DT structure. Compared to the MOS–bipolar Darlington power switch, the VFET–DT structure achieves an extremely low off-state leakage current and high-voltage withstanding capability due to the field emission mechanism of the VFET. It can also avoid the Miller effect that results from incorporating the load resistance into the feedback loop. The high gain and high-power capacity can be achieved due to the cascade of DT. The device’s typical electrical characteristics were theoretically investigated by simulation. The VFET–DT structure exhibited a high-power capacity of 20 A and 400 V with a minimum conduction voltage drop of 1.316 V and a switching frequency of 100 kHz. The results demonstrated that the combination of a vacuum transistor and a solid-state transistor combines the advantages of both and benefits the performance of the power switch. Full article
(This article belongs to the Special Issue Vacuum Electronics: From Micro to Nano)
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19 pages, 10730 KiB  
Article
Oxygen Ion Concentration Distribution Effect on Bipolar Switching Properties of Neodymium Oxide Film’s Resistance and Random Access Memory Devices
by Kai-Huang Chen, Ming-Cheng Kao, Hsin-Chin Chen and Yao-Chin Wang
Nanomaterials 2025, 15(6), 448; https://doi.org/10.3390/nano15060448 - 15 Mar 2025
Viewed by 577
Abstract
In this study, the bipolar resistance switching behavior and electrical conduction transport properties of a neodymium oxide film’s resistive random access memory (RRAM) devices for using different top electrode materials were observed and discussed. Different related electrical properties and transport mechanisms are important [...] Read more.
In this study, the bipolar resistance switching behavior and electrical conduction transport properties of a neodymium oxide film’s resistive random access memory (RRAM) devices for using different top electrode materials were observed and discussed. Different related electrical properties and transport mechanisms are important factors in applications in a film’s RRAM devices. For aluminum top electrode materials, the electrical conduction mechanism of the neodymium oxide film’s RRAM devices all exhibited hopping conduction behavior, with 1 mA and 10 mA compliance currents in the set state for low/high voltages applied. For TiN and ITO (Indium tin oxide) top electrode materials, the conduction mechanisms all exhibited ohmic conduction for the low voltage applied, and all exhibited hopping conduction behavior for the high voltage applied. In addition, the electrical field strength simulation resulted in an increase in the reset voltage, indicating that oxygen ions have diffused into the vicinity of the ITO electrode during the set operation. This was particularly the case in the three physical models proposed, and based on the relationship between different ITO electrode thicknesses and the oxygen ion concentration distribution effect of the neodymium oxide film’s RRAM devices, they were investigated and discussed. To prove the oxygen concentration distribution expands over the area of the ITO electrode, the simulation software was used to analyze and simulate the distribution of the electric field for the Poisson equation. Finally, the neodymium oxide film’s RRAM devices for using different top electrode materials all exhibited high memory window properties, bipolar resistance switching characteristics, and non-volatile properties for incorporation into next-generation non-volatile memory device applications in this study. Full article
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10 pages, 6089 KiB  
Article
Reset-Voltage Controlled Resistance-State and Applications of Forming-Free Fe-Doped SrTiO3 Thin-Film Memristor
by Ke-Jing Lee, Cheng-Hua Wu, Cheng-Jung Lee, Dei-Wei Chou, Na-Fu Wang and Yeong-Her Wang
Materials 2024, 17(20), 5021; https://doi.org/10.3390/ma17205021 - 14 Oct 2024
Viewed by 1281
Abstract
In this study, we prepared a strontium ferrite titanate (STF) thin film using a sol–gel process to insulate resistive random-access memory (RRAM) applications. Compared to the typical strontium titanate (STO) RRAM, the improvement in the resistive switching characteristics in STF RRAM is obvious. [...] Read more.
In this study, we prepared a strontium ferrite titanate (STF) thin film using a sol–gel process to insulate resistive random-access memory (RRAM) applications. Compared to the typical strontium titanate (STO) RRAM, the improvement in the resistive switching characteristics in STF RRAM is obvious. The Al/STO/ITO/Glass RRAM set/reset voltages of −1.4 V/+3.3 V and the Al/STF/ITO/Glass RRAM set/reset voltages of −0.45 V/+1.55 V presented a memory window larger than 103, a low operating voltage and device stability of more than 104 s. In this study, the influence of Fe on the conducting paths and the bipolar resistive switching properties of Al/STF/ITO/Glass RRAM devices is investigated. Full article
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13 pages, 3619 KiB  
Article
Flexible Artificial Ag NPs:a–SiC0.11:H Synapse on Al Foil with High Uniformity and On/Off Ratio for Neuromorphic Computing
by Zongyan Zuo, Chengfeng Zhou, Zhongyuan Ma, Yufeng Huang, Liangliang Chen, Wei Li, Jun Xu and Kunji Chen
Nanomaterials 2024, 14(18), 1474; https://doi.org/10.3390/nano14181474 - 10 Sep 2024
Cited by 1 | Viewed by 1333
Abstract
A neuromorphic computing network based on SiCx memristor paves the way for a next-generation brain-like chip in the AI era. Up to date, the SiCx–based memristor devices are faced with the challenge of obtaining flexibility and uniformity, which can push [...] Read more.
A neuromorphic computing network based on SiCx memristor paves the way for a next-generation brain-like chip in the AI era. Up to date, the SiCx–based memristor devices are faced with the challenge of obtaining flexibility and uniformity, which can push forward the application of memristors in flexible electronics. For the first time, we report that a flexible artificial synaptic device based on a Ag NPs:a–SiC0.11:H memristor can be constructed by utilizing aluminum foil as the substrate. The device exhibits stable bipolar resistive switching characteristic even after bending 1000 times, displaying excellent flexibility and uniformity. Furthermore, an on/off ratio of approximately 107 can be obtained. It is found that the incorporation of silver nanoparticles significantly enhances the device’s set and reset voltage uniformity by 76.2% and 69.7%, respectively, which is attributed to the contribution of the Ag nanoparticles. The local electric field of Ag nanoparticles can direct the formation and rupture of conductive filaments. The fitting results of I–V curves show that the carrier transport mechanism agrees with Poole–Frenkel (P–F) model in the high-resistance state, while the carrier transport follows Ohm’s law in the low-resistance state. Based on the multilevel storage characteristics of the Al/Ag NPs:a–SiC0.11:H/Al foil resistive switching device, we successfully observed the biological synaptic characteristics, including the long–term potentiation (LTP), long–term depression (LTD), and spike–timing–dependent plasticity (STDP). The flexible artificial Ag NPs:a–SiC0.11:H/Al foil synapse possesses excellent conductance modulation capabilities and visual learning function, demonstrating the promise of application in flexible electronics technology for high-efficiency neuromorphic computing in the AI period. Full article
(This article belongs to the Special Issue Controlled Growth and Properties of Semiconductor Nanomaterials)
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23 pages, 7018 KiB  
Review
2D and Quasi-2D Halide Perovskite-Based Resistive Switching Memory Systems
by Hyojung Kim, Daijoon Hyun, Muhammad Hilal, Zhicheng Cai and Cheon Woo Moon
Electronics 2024, 13(17), 3572; https://doi.org/10.3390/electronics13173572 - 8 Sep 2024
Cited by 7 | Viewed by 2110
Abstract
Resistive switching (RS) memory devices are gaining recognition as data storage devices due to the significant interest in their switching material, Halide perovskite (HP). The electrical characteristics include hysteresis in its current–voltage (IV) relationship. It can be attributed to [...] Read more.
Resistive switching (RS) memory devices are gaining recognition as data storage devices due to the significant interest in their switching material, Halide perovskite (HP). The electrical characteristics include hysteresis in its current–voltage (IV) relationship. It can be attributed to the production and migration of defects. This property allows HPs to be used as RS materials in memory devices. However, 3D HPs are vulnerable to moisture and the surrounding environment, making their devices more susceptible to deterioration. The potential of two-dimensional (2D)/quasi-2D HPs for optoelectronic applications has been recognized, making them a viable alternative to address current restrictions. Two-dimensional/quasi-2D HPs are created by including extended organic cations into the ABX3 frameworks. By adjusting the number of HP layers, it is possible to control the optoelectronic properties to achieve specific features for certain applications. This article presents an overview of 2D/quasi-2D HPs, including their structures, binding energies, and charge transport, compared to 3D HPs. Next, we discuss the operational principles, RS modes (bipolar and unipolar switching), in RS memory devices. Finally, there have been notable and recent breakthroughs in developing RS memory systems using 2D/quasi-2D HPs. Full article
(This article belongs to the Special Issue Advanced Materials for Intelligent Electronics)
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13 pages, 3068 KiB  
Article
Sol-Gel Derived ZnO Thin Films with Nonvolatile Resistive Switching Behavior for Future Memory Applications
by Xiangqian Shen and Zhiqiang Yu
Coatings 2024, 14(7), 824; https://doi.org/10.3390/coatings14070824 - 2 Jul 2024
Viewed by 1845
Abstract
Herein we report on a facile sol-gel spin-coating technique to fabricate ZnO thin films that grow preferentially along the (002) plane on FTO substrates. By employing the magnetron sputtering technique to deposit a tungsten (W) top metal electrode onto these ZnO thin films, [...] Read more.
Herein we report on a facile sol-gel spin-coating technique to fabricate ZnO thin films that grow preferentially along the (002) plane on FTO substrates. By employing the magnetron sputtering technique to deposit a tungsten (W) top metal electrode onto these ZnO thin films, we successfully realize a W/ZnO/FTO memory device that exhibits self-rectifying and forming-free resistive switching characteristics. Notably, the as-prepared device demonstrates impressive nonvolatile and bipolar resistive switching behavior, with a high resistance ratio (RHRS/RLRS) exceeding two orders of magnitude at a reading voltage of 0.1 V. Moreover, it exhibits ultralow set and reset voltages of approximately +0.5 V and −1 V, respectively, along with exceptional durability. In terms of carrier transport properties, the low resistance state of the device is dominated by ohmic conduction, whereas the high resistance state is characterized by trap-controlled space-charge-limited current conduction. This work highlights the potential of the ZnO-based W/ZnO/FTO memory device as a promising candidate for future high-density nonvolatile memory applications. Full article
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9 pages, 4960 KiB  
Article
The Switching Characteristics in Bilayer ZnO/HfO2 Resistive Random-Access Memory, Depending on the Top Electrode
by So-Yeon Kwon, Woon-San Ko, Jun-Ho Byun, Do-Yeon Lee, Hi-Deok Lee and Ga-Won Lee
Electron. Mater. 2024, 5(2), 71-79; https://doi.org/10.3390/electronicmat5020006 - 6 Jun 2024
Cited by 1 | Viewed by 1832
Abstract
In this study, the bipolar switching behaviors in ZnO/HfO2 bilayer resistive random-access memory (RRAM), depending on different metal top electrodes (TE), are analyzed. For this purpose, devices with two types of TE–TiN/Ti and Pd, which have varying oxygen affinities, are fabricated. X-ray [...] Read more.
In this study, the bipolar switching behaviors in ZnO/HfO2 bilayer resistive random-access memory (RRAM), depending on different metal top electrodes (TE), are analyzed. For this purpose, devices with two types of TE–TiN/Ti and Pd, which have varying oxygen affinities, are fabricated. X-ray diffraction (XRD) analysis shows that ZnO has a hexagonal wurtzite structure, and HfO2 exhibits both monoclinic and orthorhombic phases. The average grain sizes are 10.9 nm for ZnO and 1.55 nm for HfO2. In regards to the electrical characteristics, the I–V curve, cycling test, and voltage stress are measured. The measurement results indicate that devices with TiN/Ti TE exhibit lower set and higher reset voltage and stable bipolar switching behavior. However, a device with Pd TE demonstrates higher set and lower reset voltage. This phenomenon can be explained by the Gibbs free energy of formation (∆Gf°). Additionally, the Pd TE device shows unstable bipolar switching characteristics, where unipolar switching occurs simultaneously during the cycling test. This instability in devices with Pd TE could potentially lead to soft errors in operation. For guaranteeing stable bipolar switching, the oxygen affinity of material for TE should be considered in regards to ZnO/HfO2 bilayer RRAM. Full article
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13 pages, 3768 KiB  
Article
Implementation of Artificial Synapse Using IGZO-Based Resistive Switching Device
by Seongmin Kim, Dongyeol Ju and Sungjun Kim
Materials 2024, 17(2), 481; https://doi.org/10.3390/ma17020481 - 19 Jan 2024
Cited by 9 | Viewed by 2743
Abstract
In this study, we present the resistive switching characteristics and the emulation of a biological synapse using the ITO/IGZO/TaN device. The device demonstrates efficient energy consumption, featuring low current resistive switching with minimal set and reset voltages. Furthermore, we establish that the device [...] Read more.
In this study, we present the resistive switching characteristics and the emulation of a biological synapse using the ITO/IGZO/TaN device. The device demonstrates efficient energy consumption, featuring low current resistive switching with minimal set and reset voltages. Furthermore, we establish that the device exhibits typical bipolar resistive switching with the coexistence of non-volatile and volatile memory properties by controlling the compliance during resistive switching phenomena. Utilizing the IGZO-based RRAM device with an appropriate pulse scheme, we emulate a biological synapse based on its electrical properties. Our assessments include potentiation and depression, a pattern recognition system based on neural networks, paired-pulse facilitation, excitatory post-synaptic current, and spike-amplitude dependent plasticity. These assessments confirm the device’s effective emulation of a biological synapse, incorporating both volatile and non-volatile functions. Furthermore, through spike-rate dependent plasticity and spike-timing dependent plasticity of the Hebbian learning rules, high-order synapse imitation was done. Full article
(This article belongs to the Special Issue Advanced Electrical Engineering Materials and Devices)
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12 pages, 5192 KiB  
Article
Improved Resistive Switching Characteristics and Synaptic Functions of InZnO/SiO2 Bilayer Device
by Dongyeol Ju, Minsuk Koo and Sungjun Kim
Materials 2023, 16(23), 7324; https://doi.org/10.3390/ma16237324 - 24 Nov 2023
Cited by 2 | Viewed by 1704
Abstract
This paper investigates the bipolar resistive switching and synaptic characteristics of IZO single-layer and IZO/SiO2 bilayer two-terminal memory devices. The chemical properties and structure of the device with a SiO2 layer are confirmed by x-ray photoemission spectroscopy (XPS) and transmission electron [...] Read more.
This paper investigates the bipolar resistive switching and synaptic characteristics of IZO single-layer and IZO/SiO2 bilayer two-terminal memory devices. The chemical properties and structure of the device with a SiO2 layer are confirmed by x-ray photoemission spectroscopy (XPS) and transmission electron microscopy (TEM) imaging. The device with the SiO2 layer showed better memory characteristics with a low current level, as well as better cell-to-cell and cycle-to-cycle uniformity. Moreover, the neuromorphic applications of the IZO/SiO2 bilayer device are demonstrated by pulse response. Paired pulse facilitation, excitatory postsynaptic current, and pulse-width-dependent conductance changes are conducted by the coexistence of short- and long-term memory characteristics. Moreover, Hebbian rules are emulated to mimic biological synapse function. The result of potentiation, depression, spike-rate-dependent plasticity, and spike-time-dependent plasticity prove their favorable abilities for future applications in neuromorphic computing architecture. Full article
(This article belongs to the Special Issue Advanced Semiconductor/Memory Materials and Devices)
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9 pages, 2422 KiB  
Communication
Ferroelectric Resistance Switching in Epitaxial BiFeO3/La0.7Sr0.3MnO3 Heterostructures
by Hongyan Qi, Weixin Wu and Xinqi Chen
Materials 2023, 16(22), 7198; https://doi.org/10.3390/ma16227198 - 17 Nov 2023
Cited by 4 | Viewed by 1707
Abstract
BiFeO3/La0.7Sr0.3MnO3 (BFO/LSMO) epitaxial heterostructures were successfully synthesized by pulsed laser deposition on (001)-oriented SrTiO3 single-crystal substrates with Au top electrodes. Stable bipolar resistive switching characteristics regulated by ferroelectric polarization reversal was observed in the Au/BFO/LSMO [...] Read more.
BiFeO3/La0.7Sr0.3MnO3 (BFO/LSMO) epitaxial heterostructures were successfully synthesized by pulsed laser deposition on (001)-oriented SrTiO3 single-crystal substrates with Au top electrodes. Stable bipolar resistive switching characteristics regulated by ferroelectric polarization reversal was observed in the Au/BFO/LSMO heterostructures. The conduction mechanism was revealed to follow the Schottky emission model, and the Schottky barriers in high-resistance and low-resistance states were estimated based on temperature-dependent current–voltage curves. Further, the observed memristive behavior was interpreted via the modulation effect on the depletion region width and the Schottky barrier height caused by ferroelectric polarization reversal, combining with the oxygen vacancies migration near the BFO/LSMO interface. Full article
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13 pages, 3774 KiB  
Article
Double-Forming Mechanism of TaOx-Based Resistive Memory Device and Its Synaptic Applications
by Dongyeol Ju, Sunghun Kim, Subaek Lee and Sungjun Kim
Materials 2023, 16(18), 6184; https://doi.org/10.3390/ma16186184 - 13 Sep 2023
Viewed by 1535
Abstract
The bipolar resistive switching properties of Pt/TaOx/InOx/ITO-resistive random-access memory devices under DC and pulse measurement conditions are explored in this work. Transmission electron microscopy and X-ray photoelectron spectroscopy were used to confirm the structure and chemical compositions of the [...] Read more.
The bipolar resistive switching properties of Pt/TaOx/InOx/ITO-resistive random-access memory devices under DC and pulse measurement conditions are explored in this work. Transmission electron microscopy and X-ray photoelectron spectroscopy were used to confirm the structure and chemical compositions of the devices. A unique two-step forming process referred to as the double-forming phenomenon and self-compliance characteristics are demonstrated under a DC sweep. A model based on oxygen vacancy migration is proposed to explain its conduction mechanism. Varying reset voltages and compliance currents were applied to evaluate multilevel cell characteristics. Furthermore, pulses were applied to the devices to demonstrate the neuromorphic system’s application via testing potentiation, depression, spike-timing-dependent plasticity, and spike-rate-dependent plasticity. Full article
(This article belongs to the Special Issue Advanced Semiconductor/Memory Materials and Devices)
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37 pages, 8305 KiB  
Review
Recent Advances in Cerium Oxide-Based Memristors for Neuromorphic Computing
by Sarfraz Ali, Muhammad Abaid Ullah, Ali Raza, Muhammad Waqas Iqbal, Muhammad Farooq Khan, Maria Rasheed, Muhammad Ismail and Sungjun Kim
Nanomaterials 2023, 13(17), 2443; https://doi.org/10.3390/nano13172443 - 28 Aug 2023
Cited by 10 | Viewed by 3263
Abstract
This review article attempts to provide a comprehensive review of the recent progress in cerium oxide (CeO2)-based resistive random-access memories (RRAMs). CeO2 is considered the most promising candidate because of its multiple oxidation states (Ce3+ and Ce4+), [...] Read more.
This review article attempts to provide a comprehensive review of the recent progress in cerium oxide (CeO2)-based resistive random-access memories (RRAMs). CeO2 is considered the most promising candidate because of its multiple oxidation states (Ce3+ and Ce4+), remarkable resistive-switching (RS) uniformity in DC mode, gradual resistance transition, cycling endurance, long data-retention period, and utilization of the RS mechanism as a dielectric layer, thereby exhibiting potential for neuromorphic computing. In this context, a detailed study of the filamentary mechanisms and their types is required. Accordingly, extensive studies on unipolar, bipolar, and threshold memristive behaviors are reviewed in this work. Furthermore, electrode-based (both symmetric and asymmetric) engineering is focused for the memristor’s structures such as single-layer, bilayer (as an oxygen barrier layer), and doped switching-layer-based memristors have been proved to be unique CeO2-based synaptic devices. Hence, neuromorphic applications comprising spike-based learning processes, potentiation and depression characteristics, potentiation motion and synaptic weight decay process, short-term plasticity, and long-term plasticity are intensively studied. More recently, because learning based on Pavlov’s dog experiment has been adopted as an advanced synoptic study, it is one of the primary topics of this review. Finally, CeO2-based memristors are considered promising compared to previously reported memristors for advanced synaptic study in the future, particularly by utilizing high-dielectric-constant oxide memristors. Full article
(This article belongs to the Topic Energy Storage Materials and Devices)
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10 pages, 2807 KiB  
Article
Sol–Gel-Processed Y2O3 Multilevel Resistive Random-Access Memory Cells for Neural Networks
by Taehun Lee, Hae-In Kim, Yoonjin Cho, Sangwoo Lee, Won-Yong Lee, Jin-Hyuk Bae, In-Man Kang, Kwangeun Kim, Sin-Hyung Lee and Jaewon Jang
Nanomaterials 2023, 13(17), 2432; https://doi.org/10.3390/nano13172432 - 27 Aug 2023
Cited by 10 | Viewed by 1911
Abstract
Yttrium oxide (Y2O3) resistive random-access memory (RRAM) devices were fabricated using the sol–gel process on indium tin oxide/glass substrates. These devices exhibited conventional bipolar RRAM characteristics without requiring a high-voltage forming process. The effect of current compliance on the [...] Read more.
Yttrium oxide (Y2O3) resistive random-access memory (RRAM) devices were fabricated using the sol–gel process on indium tin oxide/glass substrates. These devices exhibited conventional bipolar RRAM characteristics without requiring a high-voltage forming process. The effect of current compliance on the Y2O3 RRAM devices was investigated, and the results revealed that the resistance values gradually decreased with increasing set current compliance values. By regulating these values, the formation of pure Ag conductive filament could be restricted. The dominant oxygen ion diffusion and migration within Y2O3 leads to the formation of oxygen vacancies and Ag metal-mixed conductive filaments between the two electrodes. The filament composition changes from pure Ag metal to Ag metal mixed with oxygen vacancies, which is crucial for realizing multilevel cell (MLC) switching. Consequently, intermediate resistance values were obtained, which were suitable for MLC switching. The fabricated Y2O3 RRAM devices could function as a MLC with a capacity of two bits in one cell, utilizing three low-resistance states and one common high-resistance state. The potential of the Y2O3 RRAM devices for neural networks was further explored through numerical simulations. Hardware neural networks based on the Y2O3 RRAM devices demonstrated effective digit image classification with a high accuracy rate of approximately 88%, comparable to the ideal software-based classification (~92%). This indicates that the proposed RRAM can be utilized as a memory component in practical neuromorphic systems. Full article
(This article belongs to the Special Issue Nanostructures for Integrated Devices)
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13 pages, 5607 KiB  
Article
Activation Energy and Bipolar Switching Properties for the Co-Sputtering of ITOX:SiO2 Thin Films on Resistive Random Access Memory Devices
by Kai-Huang Chen, Chien-Min Cheng, Na-Fu Wang and Ming-Cheng Kao
Nanomaterials 2023, 13(15), 2179; https://doi.org/10.3390/nano13152179 - 26 Jul 2023
Cited by 1 | Viewed by 1727
Abstract
Activation energy, bipolar resistance switching behavior, and the electrical conduction transport properties of ITOX:SiO2 thin film resistive random access memory (RRAM) devices were observed and discussed. The ITOX:SiO2 thin films were prepared using a co-sputtering deposition method [...] Read more.
Activation energy, bipolar resistance switching behavior, and the electrical conduction transport properties of ITOX:SiO2 thin film resistive random access memory (RRAM) devices were observed and discussed. The ITOX:SiO2 thin films were prepared using a co-sputtering deposition method on the TiN/Si substrate. For the RRAM device structure fabrication, an Al/ITOX:SiO2/TiN/Si structure was prepared by using aluminum for the top electrode and a TiN material for the bottom electrode. In addition, grain growth, defect reduction, and RRAM device performance of the ITOX:SiO2 thin film for the various oxygen gas flow conditions were observed and described. Based on the I-V curve measurements of the RRAM devices, the turn on-off ratio and the bipolar resistance switching properties of the Al/ITOX:SiO2/TiN/Si RRAM devices in the set and reset states were also obtained. At low operating voltages and high resistance values, the conductance mechanism exhibits hopping conduction mechanisms for set states. Moreover, at high operating voltages, the conductance mechanism behaves as an ohmic conduction current mechanism. Finally, the Al/ITOX:SiO2/TiN/Si RRAM devices demonstrated memory window properties, bipolar resistance switching behavior, and nonvolatile characteristics for next-generation nonvolatile memory applications. Full article
(This article belongs to the Special Issue Nano-Structured Thin Films: Growth, Characteristics, and Application)
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13 pages, 5150 KiB  
Article
Electrical Characteristics of CMOS-Compatible SiOx-Based Resistive-Switching Devices
by Maria N. Koryazhkina, Dmitry O. Filatov, Stanislav V. Tikhov, Alexey I. Belov, Dmitry A. Serov, Ruslan N. Kryukov, Sergey Yu. Zubkov, Vladislav A. Vorontsov, Dmitry A. Pavlov, Evgeny G. Gryaznov, Elena S. Orlova, Sergey A. Shchanikov, Alexey N. Mikhaylov and Sungjun Kim
Nanomaterials 2023, 13(14), 2082; https://doi.org/10.3390/nano13142082 - 16 Jul 2023
Cited by 4 | Viewed by 1450
Abstract
The electrical characteristics and resistive switching properties of memristive devices have been studied in a wide temperature range. The insulator and electrode materials of these devices (silicon oxide and titanium nitride, respectively) are fully compatible with conventional complementary metal-oxide-semiconductor (CMOS) fabrication processes. Silicon [...] Read more.
The electrical characteristics and resistive switching properties of memristive devices have been studied in a wide temperature range. The insulator and electrode materials of these devices (silicon oxide and titanium nitride, respectively) are fully compatible with conventional complementary metal-oxide-semiconductor (CMOS) fabrication processes. Silicon oxide is also obtained through the low-temperature chemical vapor deposition method. It is revealed that the as-fabricated devices do not require electroforming but their resistance state cannot be stored before thermal treatment. After the thermal treatment, the devices exhibit bipolar-type resistive switching with synaptic behavior. The conduction mechanisms in the device stack are associated with the effect of traps in the insulator, which form filaments in the places where the electric field is concentrated. The filaments shortcut the capacitance of the stack to different degrees in the high-resistance state (HRS) and in the low-resistance state (LRS). As a result, the electron transport possesses an activation nature with relatively low values of activation energy in an HRS. On the contrary, Ohm’s law and tunneling are observed in an LRS. CMOS-compatible materials and low-temperature fabrication techniques enable the easy integration of the studied resistive-switching devices with traditional analog–digital circuits to implement new-generation hardware neuromorphic systems. Full article
(This article belongs to the Special Issue Advances in Memristive Nanomaterials)
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