Reprint
Current Research in Thin Film Deposition
Applications, Theory, Processing, and Characterisation
Edited by
June 2021
154 pages
- ISBN978-3-0365-0512-1 (Hardback)
- ISBN978-3-0365-0513-8 (PDF)
This book is a reprint of the Special Issue Current Research in Thin Film Deposition: Applications, Theory, Processing, and Characterisation that was published in
Chemistry & Materials Science
Engineering
Summary
Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology.
Format
- Hardback
License
© 2022 by the authors; CC BY-NC-ND license
Keywords
PECVD; plasma diagnostics; nc-Si:H; RF-PECVD; Fourier-transform infrared spectroscopy (FTIR); quadruple mass spectrometry (QMS); optical emission spectroscopy (OES); X-ray diffraction spectroscopy (XRD); micro hollow glass spheres (MHGS); solid micro glass spheres (SMGS); liquid phase deposition (LPD); aluminum coating; β-Ga2O3; MOCVD; VI/III ratio; scandium stabilized zirconia thin films; e-beam physical vapor deposition; thin films ceramics; Raman spectroscopy; X-ray diffraction; initiated chemical vapor deposition (iCVD); superhydrophobic; fluoropolymer; thin film; atomic layer deposition; nanomechanics; Young’s modulus; shear modulus; resonant frequency; Q-factor; microcantilevers; internal stress; nickel–chromium; thin film thermocouples; physical vapor deposition; flat film extrusion; foil quality; MgF2; color center absorption; density; crystal frequency; stress; adhesion; polarization controlling; dual functional-metalens; focusing; splitting; PVD coatings; nanoindentation; brittle cracking; fracture toughness; diamond coatings; residual stresses; interfacial fatigue strength; annealing; milling; n/a