Kexin Jiang recently completed his master’s degree in electronic information at the School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China (UESTC). His research focuses on micro-/nanopatterning for photonic and sensing devices, including deep-UV dual-beam laser interference lithography and diffractive flat-top beam shaping.
Mingliang Xie is a graduate student at the School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), pursuing a master’s degree in optical engineering. His research interests include diffractive optical neural networks, imaging through scattering media, and computational optics.
Zhe Tang received his B.S. degree in measurement, control technology and instruments from the School of Mechanical Engineering, Sichuan University. He is currently pursuing an M.S. degree in measurement and metrology technology and instruments at the University of the Chinese Academy of Sciences. His research focuses on high-precision nanoimprint alignment and overlay processes. He is an assistant engineer of the Instrument and Meter Association and a student member of the Sichuan Optical Society.
Xiren Zhang is a professor at the University of Electronic Science and Technology of China (UESTC), Chengdu, China. He received his M.S. in control science and engineering from Xi’an Jiaotong University in 2004, and his Ph.D. in signal and information processing from the Institute of Optics and Electronics, Chinese Academy of Sciences, in 2008. From January 2014 to January 2015 he was a visiting scholar at Washington University in St. Louis, working with Prof. Lihong V. Wang on photoacoustic imaging. His research focuses on optical imaging in scattering media, optoelectronic imaging system development, machine vision, and Internet of Things technologies. He has led or participated in projects supported by the National Natural Science Foundation of China, the Sichuan Provincial Youth Fund, CAS frontier programs, the National Key R&D Program of China, the 863 Program, and industry collaborations. He has published about 20 papers, including more than 10 SCI-indexed articles, in journals such as Applied Physics Letters, the Journal of Applied Physics, EPJ Special Topics, the International Journal of Thermophysics, Chinese Physics B, and Acta Physica Sinica.
Dr. Dongxu Yang is a researcher (research professor) and doctoral supervisor at the Institute of Optics and Electronics, Chinese Academy of Sciences (IOE, CAS), and Deputy Director of the National Key Laboratory of Light Field Regulation Science and Technology. He received his B.S. from Sichuan University in 2011 and his Ph.D. in materials science and engineering from the University of Birmingham, UK, in 2016. He has worked as an R&D engineer at Semiconductor Manufacturing International Corporation (2016–2018), completed a postdoctoral fellowship at the University of Electronic Science and Technology of China (2018–2021), served as an associate researcher at IOE, CAS (2021–2024), and has been a researcher since 2024. His research spans advanced photoresist and photosensitive polyimide materials, thin-film materials for semiconductor manufacturing, quantum-dot functional materials, and atomic/molecular self-assembly, as well as micro-/nanofabrication including high-resolution interference lithography, surface imaging, and chemical bonding adhesion lithography. Dr. Yang has been recognized as a High-Level Young Talent by the Chinese Academy of Sciences and by Sichuan Province.
