Next Article in Journal
Acknowledgement to Reviewers of QuBS in 2018
Next Article in Special Issue
3D Shape Analysis of Powder for Laser Beam Melting by Synchrotron X-ray CT
Previous Article in Journal / Special Issue
New Structural Insight into Interface-Controlled α–σ Phase Transformation in Fe-Cr Alloys
Article Menu
Issue 1 (March) cover image

Export Article

Open AccessArticle

Stress Relaxation Related to Spontaneous Thin Film Buckling: Correlation between Finite Element Calculations and Micro Diffraction Analysis

1
China Electric Power Research Institute, N°15, Xiaoying Rd(E), Qinghe, Beijing 100192, China
2
Department of Mechanics, Tianjin University, Tianjin 300072, China
3
Advanced Light Source-Lawrence Berkeley National Laboratory (ALS-LBNL), 1 Cyclotron Road, MS 2-400, Berkeley, CA 94720, USA
4
Institut Pprime, UPR 3346 CNRS-Université de Poitiers - ENSMA, BP 30179, 86962 Futuroscope, France
*
Author to whom correspondence should be addressed.
Quantum Beam Sci. 2019, 3(1), 1; https://doi.org/10.3390/qubs3010001
Received: 1 November 2018 / Revised: 14 December 2018 / Accepted: 18 December 2018 / Published: 20 December 2018
  |  
PDF [2882 KB, uploaded 21 December 2018]
  |  

Abstract

Compressive residual stresses generated during thin film deposition may lead to undesirable film damage, such as delamination, buckling, and flaking, ultimately leading to the failure of the device employing the film. Understanding the residual stress generation and role in these damage mechanisms is necessary to preserve thin film integrity and optimize its functional properties. Thin shell theory has been used for decades to predict buckling but the results have not yet been correlated with experimental data since the techniques used to measure stress in metallic films were not able to do so at the required micron scale until recently. Micro scanning X-ray diffraction now enables the direct mapping of the local stress of metallic films. In this paper, finite element method based on thin shell theory and synchrotron X-ray micro diffraction have been used to determine stress maps of thin film buckling patterns. Calculations of the stress distribution in the metallic films have been performed taking into account the buckling geometry determined from optical measurements. Stress distributions over gold blisters and tungsten wrinkles obtained with the two techniques are in fair agreement and allow for the accurate determination of the stress relaxation profile from the bottom to the top of the buckling, validating the thin shell theory model. View Full-Text
Keywords: metallic thin films; residual stresses; delamination; synchrotron X-ray diffraction; finite element method (FEM); strain/stress measurements metallic thin films; residual stresses; delamination; synchrotron X-ray diffraction; finite element method (FEM); strain/stress measurements
Figures

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
SciFeed

Share & Cite This Article

MDPI and ACS Style

Jia, H.; Wang, S.B.; Tamura, N.; Goudeau, P. Stress Relaxation Related to Spontaneous Thin Film Buckling: Correlation between Finite Element Calculations and Micro Diffraction Analysis. Quantum Beam Sci. 2019, 3, 1.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Quantum Beam Sci. EISSN 2412-382X Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top