Improved Adhesion Strength of Silica Thin Films on Polycarbonate Substrates Without an Interlayer Using Remote Atmospheric-Pressure Chemical Vapor Deposition
Highlights
- Surface treatments were investigated to improve adhesion between thin films and substrates.
- Pressure Chemical Vapor Deposition was used to deposit the thin films.
- Thin films on flame-treated substrates showed a 26% improvement in adhesion.
- Thin films on silicone-baking-treated substrates showed a 22% improvement in adhesion.
- Precise control of substrate surface conditions is expected to improve silica thin-film adhesion.
Abstract
1. Introduction
2. Materials and Methods
2.1. Surface Treatments
2.2. Thin-Film Preparation
2.3. Characterization
3. Results
3.1. Acrylic Primer
3.2. Flame Treatment
3.3. Silicone Baking Treatment
3.4. Thin-Film Adhesion
4. Discussion
5. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
Abbreviations
| DBD | Dielectric barrier discharge |
| PET | Polyethylene terephthalate |
| SEM | Scanning electron microscopy |
| XPS | X-ray photoelectron spectroscopy |
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| Sample | Thickness [nm] | Si [%] | Adhesion [mN] n = 3 | Hardness [GPa] n = 12 | ||
|---|---|---|---|---|---|---|
| Average | Div | Average | Div | |||
| With primer | 157 | 22.5 | 150.0 | 3.6 | 1.09 | 0.25 |
| Without primer | 187 | 27.8 | 34.4 | 0.5 | 1.29 | 0.11 |
| Number of Flame Treatments | Film Thickness [nm] | Si [%] | Adhesion [mN] | Hardness [GPa] | ||
|---|---|---|---|---|---|---|
| Average | Div | Average | Div | |||
| 0 (no treatment) | 187 | 27.8 | 34.4 | 0.5 | 1.29 | 0.11 |
| 3 | 223 | 24.4 | 38.1 | 1.0 | 1.22 | 0.12 |
| 5 | 235 | 20.1 | 41.8 | 0.4 | 1.83 | 0.19 |
| 10 | 233 | 24.1 | 43.5 | 0.4 | 2.20 | 0.45 |
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© 2026 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license.
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Endo, H.; Shirakura, A.; Suzukia, T. Improved Adhesion Strength of Silica Thin Films on Polycarbonate Substrates Without an Interlayer Using Remote Atmospheric-Pressure Chemical Vapor Deposition. Coatings 2026, 16, 593. https://doi.org/10.3390/coatings16050593
Endo H, Shirakura A, Suzukia T. Improved Adhesion Strength of Silica Thin Films on Polycarbonate Substrates Without an Interlayer Using Remote Atmospheric-Pressure Chemical Vapor Deposition. Coatings. 2026; 16(5):593. https://doi.org/10.3390/coatings16050593
Chicago/Turabian StyleEndo, Hayate, Akira Shirakura, and Testuya Suzukia. 2026. "Improved Adhesion Strength of Silica Thin Films on Polycarbonate Substrates Without an Interlayer Using Remote Atmospheric-Pressure Chemical Vapor Deposition" Coatings 16, no. 5: 593. https://doi.org/10.3390/coatings16050593
APA StyleEndo, H., Shirakura, A., & Suzukia, T. (2026). Improved Adhesion Strength of Silica Thin Films on Polycarbonate Substrates Without an Interlayer Using Remote Atmospheric-Pressure Chemical Vapor Deposition. Coatings, 16(5), 593. https://doi.org/10.3390/coatings16050593
