Xie, J.; Zhu, Z.; Tao, H.; Zhou, S.; Liang, Z.; Li, Z.; Yao, R.; Wang, Y.; Ning, H.; Peng, J.
Research Progress of High Dielectric Constant Zirconia-Based Materials for Gate Dielectric Application. Coatings 2020, 10, 698.
https://doi.org/10.3390/coatings10070698
AMA Style
Xie J, Zhu Z, Tao H, Zhou S, Liang Z, Li Z, Yao R, Wang Y, Ning H, Peng J.
Research Progress of High Dielectric Constant Zirconia-Based Materials for Gate Dielectric Application. Coatings. 2020; 10(7):698.
https://doi.org/10.3390/coatings10070698
Chicago/Turabian Style
Xie, Junan, Zhennan Zhu, Hong Tao, Shangxiong Zhou, Zhihao Liang, Zhihang Li, Rihui Yao, Yiping Wang, Honglong Ning, and Junbiao Peng.
2020. "Research Progress of High Dielectric Constant Zirconia-Based Materials for Gate Dielectric Application" Coatings 10, no. 7: 698.
https://doi.org/10.3390/coatings10070698
APA Style
Xie, J., Zhu, Z., Tao, H., Zhou, S., Liang, Z., Li, Z., Yao, R., Wang, Y., Ning, H., & Peng, J.
(2020). Research Progress of High Dielectric Constant Zirconia-Based Materials for Gate Dielectric Application. Coatings, 10(7), 698.
https://doi.org/10.3390/coatings10070698