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Open AccessArticle

Enhancement in Photoelectrochemical Performance of Optimized Amorphous SnS2 Thin Film Fabricated through Atomic Layer Deposition

1
Graduate School of Energy Science and Technology, Chungnam National University, Daejeon 305–764, Korea
2
Department of Materials Science and Engineering, Chungnam National University, Daejeon 305–764, Korea
*
Author to whom correspondence should be addressed.
Nanomaterials 2019, 9(8), 1083; https://doi.org/10.3390/nano9081083
Received: 1 July 2019 / Revised: 20 July 2019 / Accepted: 26 July 2019 / Published: 28 July 2019
(This article belongs to the Special Issue Photocatalytic Nanomaterials)
Two-dimensional (2D) nanomaterials have distinct optical and electrical properties owing to their unique structures. In this study, smooth 2D amorphous tin disulfide (SnS2) films were fabricated by atomic layer deposition (ALD), and applied for the first time to photoelectrochemical water splitting. The optimal stable photocurrent density of the 50-nm-thick amorphous SnS2 film fabricated at 140 °C was 51.5 µA/cm2 at an oxygen evolution reaction (0.8 V vs. saturated calomel electrode (SCE)). This value is better than those of most polycrystalline SnS2 films reported in recent years. These results are attributed mainly to adjustable optical band gap in the range of 2.80 to 2.52 eV, precise control of the film thickness at the nanoscale, and the close contact between the prepared SnS2 film and substrate. Subsequently, the photoelectron separation mechanisms of the amorphous, monocrystalline, and polycrystalline SnS2 films are discussed. Considering above advantages, the ALD amorphous SnS2 film can be designed and fabricated according to the application requirements. View Full-Text
Keywords: Amorphous SnS2 film; Atomic layer deposition; Photoelectrochemical performance; Deposition temperature; Thickness; Photoelectron separation Amorphous SnS2 film; Atomic layer deposition; Photoelectrochemical performance; Deposition temperature; Thickness; Photoelectron separation
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MDPI and ACS Style

Hu, W.; Hien, T.T.; Kim, D.; Chang, H.S. Enhancement in Photoelectrochemical Performance of Optimized Amorphous SnS2 Thin Film Fabricated through Atomic Layer Deposition. Nanomaterials 2019, 9, 1083.

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