- Article
Investigation of Polishing Pads Impregnated with Fe and Al2O3 Particles for Single-Crystal Silicon Carbide Wafers
- Jihng-Kuo Ho,
- Chih-Yung Huang,
- Ming-Yi Tsai and
- Che-Cheng Tsai
This study focuses on the development of a novel polishing pad for SiC wafers. Fe and Al2O3 particles were impregnated in a polyurethane matrix, thus forming a fixed abrasive polishing pad. Four types of pads with different compositions of Fe and Al2...

