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Journal: Materials, 2025
Volume: 18
Number: 5420
Article:
Electrically Active Defects and Traps and Their Relation to Stoichiometry and Chemical Environment in HfO2/Al2O3 Dielectric Stacks as Revealed by XPS
Authors:
by
Dencho Spassov, Albena Paskaleva, Ivalina Avramova, Wojciech Wozniak and Elzbieta Guziewicz
Link:
https://www.mdpi.com/1996-1944/18/23/5420
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