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Journal: Materials, 2025
Volume: 18
Number: 3940

Article: The Influence of the Ar/N2 Ratio During Reactive Magnetron Sputtering of TiN Electrodes on the Resistive Switching Behavior of MIM Devices
Authors: by Piotr Jeżak, Aleksandra Seweryn, Marcin Klepka and Robert Mroczyński
Link: https://www.mdpi.com/1996-1944/18/17/3940

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