Attenuation of Redox Interference in RuO2 pH Sensor Using a Ta2O5/Nafion Multilayer Architecture
Highlights
- Ta2O5 layers effectively suppress dissolved oxygen interference in RuO2 pH electrodes, while Nafion coatings significantly minimise interference from significant redox-active species such as ascorbic acid and permanganate.
- A combined Ta2O5/Nafion multilayer architecture delivers near-Nernstian sensitivity, low drift, and improved stability in RuO2-based pH sensors without severely compromising response performance.
- Multilayer barrier engineering provides a practical pathway to extend solid-state RuO2 pH sensors from controlled laboratory conditions into complex real-world matrices such as various beverages.
- The combined use of inorganic (Ta2O5) and polymeric (Nafion) coatings offers a design strategy for improving reliability and accuracy in electrochemical sensing platforms exposed to redox-active environments.
Abstract
1. Introduction: Challenges of Solid-State pH Sensors
1.1. Redox Interference from Electroactive Species
1.2. Drift, Hysteresis, and Long-Term Stability
1.3. Environmental Monitoring
1.4. Biofouling and Organic Contamination
1.5. Influence of Ionic Strength and Matrix Composition
1.6. Protective Layers
2. Solid Metal-Oxides Electrodes Theory
3. Methodology
3.1. RuO2 Electrode Fabrication
3.2. Electrode Modification
3.3. Potentiometric Measurements
3.4. pH Sensing Measurements
4. Results and Discussion
4.1. pH Sensing Performance
4.2. Redox Interference
4.3. Application to Beverage Samples
5. Conclusions
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
References
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| Code | Electrode |
|---|---|
| R | 500 nm RuO2 |
| R + t | 500 nm RuO2 + 150 nm Ta2O5 |
| R + T | 500 nm RuO2 + 500 nm Ta2O5 |
| R + n | 500 nm RuO2 + Dip Coated Nafion |
| R + t + n | 500 nm RuO2 + 150 nm Ta2O5 + Dip Coated Nafion |
| R + T + n | 500 nm RuO2 + 500 nm Ta2O5 + Dip Coated Nafion |
| R + N | 500 nm RuO2 + 50 µL Nafion |
| R + t + N | 500 nm RuO2 + 150 nm Ta2O5 + 50 µL Nafion |
| R + T + N | 500 nm RuO2 + 500 nm Ta2O5 + 50 µL Nafion |
| Code | Sensitivity (mV/pH) | E* | R2 | Hysteresis (mV) | Drift (mV/h) |
|---|---|---|---|---|---|
| R | −58.8 ± 0.47 | 636 ± 4.0 | 0.9999 | 1.3 ± 0.5 | 2.9 |
| R + t | −58.9 ± 0.86 | 670 ± 3.3 | 0.9995 | 1.8 ± 1.2 | 2.8 |
| R + T | −58.3 ± 0.91 | 669 ± 11 | 0.9997 | 1.8 ± 1.1 | 8.2 |
| R + n | −57.9 ± 0.49 | 606 ± 4.1 | 0.9998 | 0.54 ± 0.47 | 0.48 |
| R + t + n | −58.5 ± 0.54 | 658 ± 1.1 | 0.9998 | 0.57 ± 0.29 | 0.92 |
| R + T + n | −58.6 ± 1.1 | 744 ± 7 | 0.9994 | 3 ± 1.5 | 0.35 |
| R + N | −58.7 ± 8.5 * | 609 ± 10.6 * | 0.9995 | 31.6 ± 4.8 | 2.4 |
| R + t + N | −56.6 ± 0.89 * | 661 ± 5.1 * | 0.9971 | 56.1 ± 9.4 | 1.5 |
| R + T + N | −59.5 ± 2.8 * | 677 ± 1.4 * | 0.9998 | 46.2 ± 8.7 | 5.2 |
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Lonsdale, W.; Wajrak, M.; Hassan, M.M.; Kang, J.J. Attenuation of Redox Interference in RuO2 pH Sensor Using a Ta2O5/Nafion Multilayer Architecture. Sensors 2026, 26, 4960. https://doi.org/10.3390/s26154960
Lonsdale W, Wajrak M, Hassan MM, Kang JJ. Attenuation of Redox Interference in RuO2 pH Sensor Using a Ta2O5/Nafion Multilayer Architecture. Sensors. 2026; 26(15):4960. https://doi.org/10.3390/s26154960
Chicago/Turabian StyleLonsdale, Wade, Magdalena Wajrak, Md Mahamudul Hassan, and James Jin Kang. 2026. "Attenuation of Redox Interference in RuO2 pH Sensor Using a Ta2O5/Nafion Multilayer Architecture" Sensors 26, no. 15: 4960. https://doi.org/10.3390/s26154960
APA StyleLonsdale, W., Wajrak, M., Hassan, M. M., & Kang, J. J. (2026). Attenuation of Redox Interference in RuO2 pH Sensor Using a Ta2O5/Nafion Multilayer Architecture. Sensors, 26(15), 4960. https://doi.org/10.3390/s26154960

