Special Issue "Thin Films of Oxide and 2D Electronics, Growth, Characterization and Development"

A special issue of Crystals (ISSN 2073-4352). This special issue belongs to the section "Crystal Engineering".

Deadline for manuscript submissions: closed (20 June 2018)

Special Issue Editors

Guest Editor
Dr. Evgeny A. Stepantsov

Institute of Crystallography, Russian academy of science, Leninski prospect 59, 119333 Moscow, Russia
Interests: crystalline thin films; grain boundaries; bonding of crystals; X-ray diffraction; thin film surface morphology; thin film hetero-structures; oxide super-lattices
Guest Editor
Dr. Andrew A. Lomov

Institute of Physics and Technology, Russian academy of science, Nakhimovski prospect 36-1, 117218 Moscow, Russia
Interests: X-ray diffraction; porous silicon; anode etching of semiconducting crystals
Guest Editor
Dr. Mikhail A. Tarasov

Kotel’nikov Institute of Radio Engineering and Electronics, 125009 Mokhovaya st 11/7, Moscow, Russia
Interests: high temperature superconducting thin films; grain boundary; bi-crystal Josephson junction

Special Issue Information

Dear Colleagues,

Epitaxial thin films from oxide materials are currently the subject of massive research interest, both for fundamental science and for technological application. It concerns of different fields of electronics based on high temperature superconductivity, colossal magneto-resistance, 2D electron gas in interface of two different oxide crystals, spintronics and so on.

Integration of epitaxial oxide films within real device structures currently represents the main challenge in moving from the laboratory stage to industrial applications. This implies the solving of several complex material science and development problems, such as growth of high structural quality oxide films, including their multilayer compositions; film characterization of crystallinity, surface morphology, electronic properties; and the improvement of oxide thin film characteristics by physical post-growth treatment.

This Special Issue will be dedicated to describing new developments connected to different methods of oxide thin film growth, post growth processing and characterization. This Special Issue will include papers on the topics summarized in the keywords, though is not limited to them.

Dr. Evgeny A. Stepantsov
Dr. Andrew A. Lomov
Dr. Mikhail A.Tarasov
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Crystals is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1200 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers

There is no accepted submissions to this special issue at this moment.
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