Special Issue "Recent Aspects of Thin Films Deposited by Magnetron Sputtering and Emerging Applications"

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A special issue of Coatings (ISSN 2079-6412).

Deadline for manuscript submissions: closed (31 August 2016)

Special Issue Editor

Guest Editor
Prof. Dr. Joaquim Carneiro

Department of Physics, School of Science, University of Minho, Azurém Campus4800-058 Guimarães, Portugal
Website | E-Mail
Phone: +351253510400
Fax: +351 253 510 400
Interests: material science and nanotechnology; thin films—magnetron sputtering deposition; functionalized nanoscale and nanostructured materials and surfaces; development and characterization of photocatalytic coatings (thin films, nanoparticles) with self-cleaning, anti- fogging, air-purifying and anti- antibacterial functions; structure and surface characterization by electron microscopy (SEM, TEM) and atomic force microscopy (AFM)

Special Issue Information

Dear Colleagues,

This special issue aims at the publication of theoretical and experimental studies and reviews related to the optical, electronic, magnetic, mechanical and sensing properties of thin films produced by magnetron sputtering. We invite researchers to contribute original innovative research works that will foster the continuous development of advanced concepts for the benefit, in the short and medium term, of the scientific community and industrial sectors, with potential impact on specific market niches and its end-users.

Magnetron sputtering is a method for physical vapor deposition (PVD) of thin films. Sputtering has been widely used in dissimilar sectors including semiconductor, optical/optoelectronic, photovoltaic, tooling, biomedical, automotive, aeronautic, aerospace industries. Among the available deposition methods, magnetron sputtering (MS) is of particular interest as it can be used to prepare good quality thin films and is an environmentally friendly industrial process, which can be applied to large-area substrates or even when large-scale production is required.

Papers dealing with, but not limited to, the following topical subheadings are deemed suitable for publication:

  • Production and Characterization
  • Surfaces and Interfaces Behavior
  • Metallurgical, Protective, and Hard Coatings
  • Mechanics and Nanomechanics of Thin Films
  • Electronics, Optics, and Opto-electronics
  • Magnetics and Magneto-optics
  • Photocatalytic and Self-cleaning Thin Films
  • Biological Applications of Thin Films
  • Thin Film Devices: e.g. Sensors and Actuators

Moreover, articles related to nanostructured features of these advanced thin film based materials will also be considered suitable for publication.

Prof. Dr. Joaquim Carneiro
Guest Editor

Submission

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. Papers will be published continuously (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are refereed through a peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed Open Access quarterly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 300 CHF (Swiss Francs). English correction and/or formatting fees of 250 CHF (Swiss Francs) will be charged in certain cases for those articles accepted for publication that require extensive additional formatting and/or English corrections.

Keywords

  • multifunctional materials
  • thin films
  • magnetron sputtering, vacuum technology and applications
  • advanced characterization of materials

Published Papers (5 papers)

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Research

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Open AccessCommunication A Novel Technique for the Deposition of Bismuth Tungstate onto Titania Nanoparticulates for Enhancing the Visible Light Photocatalytic Activity
Coatings 2016, 6(3), 29; doi:10.3390/coatings6030029
Received: 17 June 2016 / Revised: 12 July 2016 / Accepted: 19 July 2016 / Published: 21 July 2016
Cited by 1 | PDF Full-text (3909 KB) | HTML Full-text | XML Full-text
Abstract
A novel powder handling technique was used to allow the deposition of bismuth tungstate coatings onto commercial titanium dioxide photocatalytic nanoparticles. The coatings were deposited by reactive pulsed DC magnetron sputtering in an argon/oxygen atmosphere. The use of an oscillating bowl with rotary
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A novel powder handling technique was used to allow the deposition of bismuth tungstate coatings onto commercial titanium dioxide photocatalytic nanoparticles. The coatings were deposited by reactive pulsed DC magnetron sputtering in an argon/oxygen atmosphere. The use of an oscillating bowl with rotary particle propagation, positioned beneath two closed-field planar magnetrons, provided uniform coverage of the titania particle surfaces. The bismuth/tungsten atomic ratio of the coatings was controlled by varying the power applied to each target. The resulting materials were characterized by X-ray diffraction, energy-dispersive X-ray spectroscopy (EDX), Brunauer–Emmett–Teller (BET) surface area measurements, transmission electron microscopy (TEM), and UV-visible diffuse reflectance spectroscopy. Photocatalytic properties under visible light irradiation were assessed using an acetone degradation test. It was found that deposition of bismuth tungstate onto titania nanoparticles resulted in significant increases in visible light photocatalytic activity, compared to uncoated titania. Of the coatings studied, the highest photocatalytic activity was measured for the sample with a Bi/W atomic ratio of 2/1. Full article
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Open AccessArticle Sputter-Deposited Indium–Tin Oxide Thin Films for Acetaldehyde Gas Sensing
Coatings 2016, 6(2), 19; doi:10.3390/coatings6020019
Received: 24 March 2016 / Revised: 8 April 2016 / Accepted: 11 April 2016 / Published: 14 April 2016
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Abstract
Reactive dual-target DC magnetron sputtering was used to prepare In–Sn oxide thin films with a wide range of compositions. The films were subjected to annealing post-treatment at 400 °C or 500 °C for different periods of time. Compositional and structural characterizations were performed
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Reactive dual-target DC magnetron sputtering was used to prepare In–Sn oxide thin films with a wide range of compositions. The films were subjected to annealing post-treatment at 400 °C or 500 °C for different periods of time. Compositional and structural characterizations were performed by X-ray photoelectron spectroscopy, energy dispersive X-ray spectroscopy, X-ray diffraction, Rutherford backscattering and scanning electron microscopy. Films were investigated for gas sensing at 200 °C by measuring their resistance response upon exposure to acetaldehyde mixed with synthetic air. We found that the relative indium-to-tin content was very important and that measurable sensor responses could be recorded at acetaldehyde concentrations down to 200 ppb, with small resistance drift between repeated exposures, for both crystalline SnO2-like films and for amorphous films consisting of about equal amounts of In and Sn. We also demonstrated that it is not possible to prepare crystalline sensors with intermediate indium-to-tin compositions by sputter deposition and post-annealing up to 500 °C. Full article
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Open AccessArticle On the Novel Biaxial Strain Relaxation Mechanism in Epitaxial Composition Graded La1−xSrxMnO3 Thin Film Synthesized by RF Magnetron Sputtering
Coatings 2015, 5(4), 802-815; doi:10.3390/coatings5040802
Received: 1 October 2015 / Revised: 4 November 2015 / Accepted: 6 November 2015 / Published: 11 November 2015
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Abstract
We report on a novel method to fabricate composition gradient, epitaxial La1−xSrxMnO3 thin films with the objective to alleviate biaxial film strain. In this work, epitaxial, composition gradient La1−xSrxMnO3, and pure LaMnO3
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We report on a novel method to fabricate composition gradient, epitaxial La1−xSrxMnO3 thin films with the objective to alleviate biaxial film strain. In this work, epitaxial, composition gradient La1−xSrxMnO3, and pure LaMnO3 and La0.67Sr0.33MnO3 thin films were deposited by radio frequency (RF) magnetron sputtering. The crystalline and epitaxy of all films were first studied by symmetric θ–2θ X-ray diffraction (XRD) and low angle XRD experiments. Detailed microstructural characterization across the film thickness was conducted by high-resolution transmission electron microscopy and electron diffraction. Four compositional gradient domains were observed in the La1−xSrxMnO3 film ranging from LaMnO3 rich to La0.67Sr0.33MnO3 at the surface. A continuous reduction in the lattice parameter was observed accompanied by a significant reduction in the out-of-plane strain in the film. Fabrication of the composition gradient La1−xSrxMnO3 thin film was found to be a powerful method to relieve biaxial strain under critical thickness. Besides, the coexistence of domains with a composition variance is opening up various new possibilities of designing new nanoscale structures with unusual cross coupled properties. Full article
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Open AccessArticle Empirical-Statistical Study on the Relationship between Deposition Parameters, Process Variables, Deposition Rate and Mechanical Properties of a-C:H:W Coatings
Coatings 2014, 4(4), 772-795; doi:10.3390/coatings4040772
Received: 22 October 2014 / Revised: 28 October 2014 / Accepted: 8 December 2014 / Published: 15 December 2014
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Abstract
Tungsten-modified hydrogenated amorphous carbon coatings (a-C:H:W) were deposited on high speed steel by reactive magnetron sputtering of a tungsten carbide target in an argon-ethine atmosphere. The deposition parameters, sputtering power, bias voltage, argon and ethine flow rate, were varied according to a central
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Tungsten-modified hydrogenated amorphous carbon coatings (a-C:H:W) were deposited on high speed steel by reactive magnetron sputtering of a tungsten carbide target in an argon-ethine atmosphere. The deposition parameters, sputtering power, bias voltage, argon and ethine flow rate, were varied according to a central composite design comprising 25 different parameter combinations. For comparison, a tungsten carbide coating was deposited, as well. During coating deposition, the process variables, total pressure, sputtering voltage and bias current, were measured as process characteristics. The thickness of the deposited coatings was determined using the crater grinding method, and the deposition rate was calculated. Young’s modulus E and indentation hardness HIT were characterized by means of nanoindentation. With E = 80 Full article
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Review

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Open AccessReview Recent Developments in R.F. Magnetron Sputtered Thin Films for pH Sensing Applications—An Overview
Coatings 2014, 4(4), 756-771; doi:10.3390/coatings4040756
Received: 30 September 2014 / Revised: 21 November 2014 / Accepted: 24 November 2014 / Published: 1 December 2014
Cited by 6 | PDF Full-text (1076 KB) | HTML Full-text | XML Full-text
Abstract
pH sensors are widely used in chemical and biological applications. Metal oxides-based pH sensors have many attractive features including insolubility, stability, mechanical strength, electrocatalyst and manufacturing technology. Various metal oxide thin films prepared by radio frequency (R.F.) magnetron sputtering have attractive features, including
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pH sensors are widely used in chemical and biological applications. Metal oxides-based pH sensors have many attractive features including insolubility, stability, mechanical strength, electrocatalyst and manufacturing technology. Various metal oxide thin films prepared by radio frequency (R.F.) magnetron sputtering have attractive features, including high pH sensitivity, fast response, high resolution, good stability and reversibility as well as potential for measuring pH under conditions that are not favourable for the commonly used glass electrodes-based pH sensors. In addition, thin film pH sensors prepared by R.F. magnetron sputtering offer many advantages, such as ease of packaging, low cost through the use of standard microfabrication processes, miniaturisation, capability of measuring pH at high temperatures, ruggedness and disposability. In this paper, recent development of R.F. magnetron sputtered thin films for pH sensing applications are reviewed. Full article

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