Design of Energy Aware Adder Circuits Considering Random Intra-Die Process Variations
AbstractEnergy consumption is one of the main barriers to current high-performance designs. Moreover, the increased variability experienced in advanced process technologies implies further timing yield concerns and therefore intensifies this obstacle. Thus, proper techniques to achieve robust designs are a critical requirement for integrated circuit success. In this paper, the influence of intra-die random process variations is analyzed considering the particular case of the design of energy aware adder circuits. Five well known adder circuits were designed exploiting an industrial 45 nm static complementary metal-oxide semiconductor (CMOS) standard cell library. The designed adders were comparatively evaluated under different energy constraints. As a main result, the performed analysis demonstrates that, for a given energy budget, simpler circuits (which are conventionally identified as low-energy slow architectures) operating at higher power supply voltages can achieve a timing yield significantly better than more complex faster adders when used in low-power design with supply voltages lower than nominal. View Full-Text
Scifeed alert for new publicationsNever miss any articles matching your research from any publisher
- Get alerts for new papers matching your research
- Find out the new papers from selected authors
- Updated daily for 49'000+ journals and 6000+ publishers
- Define your Scifeed now
Lanuzza, M.; Frustaci, F.; Perri, S.; Corsonello, P. Design of Energy Aware Adder Circuits Considering Random Intra-Die Process Variations. J. Low Power Electron. Appl. 2011, 1, 97-108.
Lanuzza M, Frustaci F, Perri S, Corsonello P. Design of Energy Aware Adder Circuits Considering Random Intra-Die Process Variations. Journal of Low Power Electronics and Applications. 2011; 1(1):97-108.Chicago/Turabian Style
Lanuzza, Marco; Frustaci, Fabio; Perri, Stefania; Corsonello, Pasquale. 2011. "Design of Energy Aware Adder Circuits Considering Random Intra-Die Process Variations." J. Low Power Electron. Appl. 1, no. 1: 97-108.