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Coatings 2018, 8(2), 49; doi:10.3390/coatings8020049

Influence of a Scanning Radial Magnetic Field on Macroparticle Reduction of Arc Ion-Plated Films

School of Mechanical Engineering & Automation, Northeastern University, Shenyang 110004, China
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Received: 24 November 2017 / Revised: 14 January 2018 / Accepted: 23 January 2018 / Published: 25 January 2018
(This article belongs to the Special Issue Hybrid Surface Coatings & Process (Selected Papers from HyMaP 2017))
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Abstract

Cathode spot motion influences the physical characteristics of arc plasma and the related macroparticles (MPs) in resultant films; these MPs limit the application of arc ion plating (AIP). In this paper, a scanning radial magnetic field (SRMF) was applied to the cathode surface to control the cathode spot motion and reduce the MP contamination in the deposited films. It was shown that film surface morphologies prepared using SRMF were better than those using a static radial magnetic field (RMF). The improvement was greater with increased scanning range and frequency. Using SRMF, cathode spot motion was confined to a spiral trajectory on the cathode surface and the spots moved over a large area and at a fast-moving velocity. Both the large moving area and the fast velocity decreased the temperature on the cathode surface and thus reduced the emission of the MPs. View Full-Text
Keywords: scanning radial magnetic field; macroparticle reduction; arc ion plating; cathode spot motion; temperature distribution scanning radial magnetic field; macroparticle reduction; arc ion plating; cathode spot motion; temperature distribution
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Wang, S.; Lin, Z.; Qiao, H.; Ba, D.; Zhu, L. Influence of a Scanning Radial Magnetic Field on Macroparticle Reduction of Arc Ion-Plated Films. Coatings 2018, 8, 49.

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