Multiscale Computational Fluid Dynamics: Methodology and Application to PECVD of Thin Film Solar Cells
AbstractThis work focuses on the development of a multiscale computational fluid dynamics (CFD) simulation framework with application to plasma-enhanced chemical vapor deposition of thin film solar cells. A macroscopic, CFD model is proposed which is capable of accurately reproducing plasma chemistry and transport phenomena within a 2D axisymmetric reactor geometry. Additionally, the complex interactions that take place on the surface of a-Si:H thin films are coupled with the CFD simulation using a novel kinetic Monte Carlo scheme which describes the thin film growth, leading to a multiscale CFD model. Due to the significant computational challenges imposed by this multiscale CFD model, a parallel computation strategy is presented which allows for reduced processing time via the discretization of both the gas-phase mesh and microscopic thin film growth processes. Finally, the multiscale CFD model has been applied to the PECVD process at industrially relevant operating conditions revealing non-uniformities greater than 20% in the growth rate of amorphous silicon films across the radius of the wafer. View Full-Text
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Crose, M.; Tran, A.; Christofides, P.D. Multiscale Computational Fluid Dynamics: Methodology and Application to PECVD of Thin Film Solar Cells. Coatings 2017, 7, 22.
Crose M, Tran A, Christofides PD. Multiscale Computational Fluid Dynamics: Methodology and Application to PECVD of Thin Film Solar Cells. Coatings. 2017; 7(2):22.Chicago/Turabian Style
Crose, Marquis; Tran, Anh; Christofides, Panagiotis D. 2017. "Multiscale Computational Fluid Dynamics: Methodology and Application to PECVD of Thin Film Solar Cells." Coatings 7, no. 2: 22.
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