Ta–Zr–N Thin Films Fabricated through HIPIMS/RFMS Co-Sputtering
AbstractTa–Zr–N thin films were fabricated through co-deposition of radio-frequency magnetron sputtering and high-power impulse magnetron sputtering (HIPIMS/RFMS co-sputtering). The oxidation resistance of the fabricated films was evaluated by annealing the samples in a 15-ppm O2-N2 atmosphere at 600 °C for 4 and 8 h. The mechanical properties and surface roughness of the as-deposited and annealed thin films were evaluated. The results indicated that the HIPIMS/RFMS co-sputtered Ta–Zr–N thin films exhibited superior mechanical properties and lower surface roughness than did the conventional direct current-sputtered Ta–Zr–N thin films and HIPIMS-fabricated ZrNx thin films in both the as-deposited and annealed states. View Full-Text
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Chang, L.-C.; Chang, C.-Y.; You, Y.-W. Ta–Zr–N Thin Films Fabricated through HIPIMS/RFMS Co-Sputtering. Coatings 2017, 7, 189.
Chang L-C, Chang C-Y, You Y-W. Ta–Zr–N Thin Films Fabricated through HIPIMS/RFMS Co-Sputtering. Coatings. 2017; 7(11):189.Chicago/Turabian Style
Chang, Li-Chun; Chang, Ching-Yen; You, Ya-Wen. 2017. "Ta–Zr–N Thin Films Fabricated through HIPIMS/RFMS Co-Sputtering." Coatings 7, no. 11: 189.