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Nanomaterials 2016, 6(6), 108; doi:10.3390/nano6060108

Selective Plasma Etching of Polymeric Substrates for Advanced Applications

1,2,†
and
1,2,†,*
1
Jožef Stefan International Postgraduate School, Jamova cesta 39, 1000 Ljubljana, Slovenia
2
Jožef Stefan Institute, Jamova cesta 39, 1000 Ljubljana, Slovenia
These authors contributed equally to this work.
*
Author to whom correspondence should be addressed.
Academic Editors: Krasimir Vasilev and Melanie Ramiasa
Received: 2 February 2016 / Revised: 28 May 2016 / Accepted: 30 May 2016 / Published: 7 June 2016
(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)
View Full-Text   |   Download PDF [3899 KB, uploaded 7 June 2016]   |  

Abstract

In today’s nanoworld, there is a strong need to manipulate and process materials on an atom-by-atom scale with new tools such as reactive plasma, which in some states enables high selectivity of interaction between plasma species and materials. These interactions first involve preferential interactions with precise bonds in materials and later cause etching. This typically occurs based on material stability, which leads to preferential etching of one material over other. This process is especially interesting for polymeric substrates with increasing complexity and a “zoo” of bonds, which are used in numerous applications. In this comprehensive summary, we encompass the complete selective etching of polymers and polymer matrix micro-/nanocomposites with plasma and unravel the mechanisms behind the scenes, which ultimately leads to the enhancement of surface properties and device performance. View Full-Text
Keywords: plasma etching; selectivity; surface chemistry; nanomesh; nanostructuring; polymer composite; biomaterials; adhesion; etch mask; radical atoms plasma etching; selectivity; surface chemistry; nanomesh; nanostructuring; polymer composite; biomaterials; adhesion; etch mask; radical atoms
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Puliyalil, H.; Cvelbar, U. Selective Plasma Etching of Polymeric Substrates for Advanced Applications. Nanomaterials 2016, 6, 108.

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