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Photo-Induced Micellization of Block Copolymers
AbstractWe found novel photo-induced micellizations through photolysis, photoelectron transfer, and photo-Claisen rearrangement. The photolysis-induced micellization was attained using poly(4-tert-butoxystyrene)-block-polystyrene diblock copolymer (PBSt-b-PSt). BSt-b-PSt showed no self-assembly in dichloromethane and existed as isolated copolymers. Dynamic light scattering demonstrated that the copolymer produced spherical micelles in this solvent due to irradiation with a high-pressure mercury lamp in the presence of photo-acid generators, such as bis(alkylphenyl)iodonium hexafluorophosphate, diphenyliodonium hexafluorophosphate, and triphenylsulfonium triflate. The 1H NMR analysis confirmed that PBSt-b-PSt was converted into poly(4-vinylphenol)-block-PSt by the irradiation, resulting in self-assembly into micelles. The irradiation in the presence of the photo-acid generator also induced the micellization of poly(4-pyridinemethoxymethylstyrene)-block-polystyrene diblock copolymer (PPySt-b-PSt). Micellization occurred by electron transfer from the pyridine to the photo-acid generator in their excited states and provided monodispersed spherical micelles with cores of PPySt blocks. Further, the photo-Claisen rearrangement caused the micellization of poly(4-allyloxystyrene)-block-polystyrene diblock copolymer (PASt-b-PSt). Micellization was promoted in cyclohexane at room temperature without a catalyst. During micellization, the elimination of the allyl groups competitively occurred along with the photorearrangement of the 4-allyloxystyrene units into the 3-allyl-4-hydroxystyrene units.
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Yoshida, E.; Kuwayama, S. Photo-Induced Micellization of Block Copolymers. Polymers 2010, 2, 623-648.View more citation formats
Yoshida E, Kuwayama S. Photo-Induced Micellization of Block Copolymers. Polymers. 2010; 2(4):623-648.Chicago/Turabian Style
Yoshida, Eri; Kuwayama, Satoshi. 2010. "Photo-Induced Micellization of Block Copolymers." Polymers 2, no. 4: 623-648.
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