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Micromachines 2016, 7(9), 152; doi:10.3390/mi7090152

Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning

Department of Photonics Engineering, Technical University of Denmark, Ørsteds plads 343, Kongens Lyngby DK-2800, Denmark
Author to whom correspondence should be addressed.
Academic Editors: Chang-Hwan Choi, Ishan Wathuthanthri and Ke Du
Received: 22 June 2016 / Revised: 15 August 2016 / Accepted: 24 August 2016 / Published: 1 September 2016
(This article belongs to the Special Issue Scalable Micro/Nano Patterning)
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An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective SiC structures have been investigated. It is found that the surface reflection of SiC in the visible spectral range is significantly suppressed by applying the antireflective structures. Meanwhile, optical transmission and absorption could be tuned by modifying the feature size of the structure. It is believed that this effective fabrication method of antireflective structures could also be realized on other semiconductor materials or devices. View Full-Text
Keywords: rapid thermal process; self-assembled nanopattern; antireflective surface; sub-wavelength structure; silicon carbide rapid thermal process; self-assembled nanopattern; antireflective surface; sub-wavelength structure; silicon carbide

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Ou, Y.; Fadil, A.; Ou, H. Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning. Micromachines 2016, 7, 152.

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