Next Article in Journal
Combining Electro-Osmotic Flow and FTA® Paper for DNA Analysis on Microfluidic Devices
Previous Article in Journal
Synthesis and Electro-Magneto-Mechanical Properties of Graphene Aerogels Functionalized with Co-Fe-P Amorphous Alloys
Previous Article in Special Issue
A Multithread Nested Neural Network Architecture to Model Surface Plasmon Polaritons Propagation
Article Menu

Export Article

Open AccessReview
Micromachines 2016, 7(7), 118; doi:10.3390/mi7070118

Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review

State Key Laboratory of Optical Technologies on Nano-fabrication and Micro-engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
*
Author to whom correspondence should be addressed.
Academic Editors: Pei-Cheng Ku and Jaeyoun (Jay) Kim
Received: 29 April 2016 / Revised: 25 June 2016 / Accepted: 27 June 2016 / Published: 13 July 2016
(This article belongs to the Special Issue Micro/Nano Photonic Devices and Systems)

Abstract

The rapid development of nanotechnologies and sciences has led to the great demand for novel lithography methods allowing large area, low cost and high resolution nano fabrications. Characterized by unique sub-diffraction optical features like propagation with an ultra-short wavelength and great field enhancement in subwavelength regions, surface plasmon polaritons (SPPs), including surface plasmon waves, bulk plasmon polaritons (BPPs) and localized surface plasmons (LSPs), have become potentially promising candidates for nano lithography. In this paper, investigations into plasmonic lithography in the manner of point-to-point writing, interference and imaging were reviewed in detail. Theoretical simulations and experiments have demonstrated plasmonic lithography resolution far beyond the conventional diffraction limit, even with ultraviolet light sources and single exposure performances. Half-pitch resolution as high as 22 nm (~1/17 light wavelength) was observed in plasmonic lens imaging lithography. Moreover, not only the overview of state-of-the-art results, but also the physics behind them and future research suggestions are discussed as well. View Full-Text
Keywords: surface plasmon polaritons; bulk plasmon polaritons; diffraction limit; subwavelength optics; near-field optics; metamaterial; super resolution; nano optical lithography; nanostructure fabrication surface plasmon polaritons; bulk plasmon polaritons; diffraction limit; subwavelength optics; near-field optics; metamaterial; super resolution; nano optical lithography; nanostructure fabrication
Figures

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

Scifeed alert for new publications

Never miss any articles matching your research from any publisher
  • Get alerts for new papers matching your research
  • Find out the new papers from selected authors
  • Updated daily for 49'000+ journals and 6000+ publishers
  • Define your Scifeed now

SciFeed Share & Cite This Article

MDPI and ACS Style

Wang, C.; Zhang, W.; Zhao, Z.; Wang, Y.; Gao, P.; Luo, Y.; Luo, X. Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review. Micromachines 2016, 7, 118.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Micromachines EISSN 2072-666X Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top