Next Article in Journal
Gravity-Based Precise Cell Manipulation System Enhanced by In-Phase Mechanism
Previous Article in Journal
A Microchip for High-Throughput Axon Growth Drug Screening
Article Menu

Export Article

Open AccessArticle
Micromachines 2016, 7(7), 115;

A New Method of Fixing High-Aspect-Ratio Microstructures by Gel

Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230026, China
National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
These authors contributed equally to this work.
Authors to whom correspondence should be addressed.
Academic Editor: Hongrui Jiang
Received: 19 April 2016 / Revised: 22 June 2016 / Accepted: 5 July 2016 / Published: 9 July 2016
Full-Text   |   PDF [1733 KB, uploaded 9 July 2016]   |  


In the microfabrication processes, it is necessary to examine the quality of the structures to ensure the whole process runs smoothly. However, the examination process of pattern defects is interrupted during the fabrication of high-aspect-ratio microstructures. The inevitable pattern defects arise from capillary forces which occur during the liquid drying process. In this paper, a new method that enables us to fix the microstructures with gel to restrict deformations before the rinsed liquid drying process has been proposed. It is effective to avoid the capillary forces by preventing the formation of the liquid level. The process parameters, types of gel, gel time and observation time were discussed and the flatness and thickness of the gel layer could be controlled. A series of high-aspect-ratio microstructures were fixed in good condition by gel. View Full-Text
Keywords: gel; fix; high-aspect-ratio microstructures gel; fix; high-aspect-ratio microstructures

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

Share & Cite This Article

MDPI and ACS Style

Chen, N.; Chen, X.; Xiong, P.; Hou, S.; Zhang, X.; Xiong, Y.; Liu, G.; Tian, Y. A New Method of Fixing High-Aspect-Ratio Microstructures by Gel. Micromachines 2016, 7, 115.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics



[Return to top]
Micromachines EISSN 2072-666X Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top