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Micromachines 2016, 7(7), 115; doi:10.3390/mi7070115

A New Method of Fixing High-Aspect-Ratio Microstructures by Gel

1
Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230026, China
2
National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
These authors contributed equally to this work.
*
Authors to whom correspondence should be addressed.
Academic Editor: Hongrui Jiang
Received: 19 April 2016 / Revised: 22 June 2016 / Accepted: 5 July 2016 / Published: 9 July 2016
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Abstract

In the microfabrication processes, it is necessary to examine the quality of the structures to ensure the whole process runs smoothly. However, the examination process of pattern defects is interrupted during the fabrication of high-aspect-ratio microstructures. The inevitable pattern defects arise from capillary forces which occur during the liquid drying process. In this paper, a new method that enables us to fix the microstructures with gel to restrict deformations before the rinsed liquid drying process has been proposed. It is effective to avoid the capillary forces by preventing the formation of the liquid level. The process parameters, types of gel, gel time and observation time were discussed and the flatness and thickness of the gel layer could be controlled. A series of high-aspect-ratio microstructures were fixed in good condition by gel. View Full-Text
Keywords: gel; fix; high-aspect-ratio microstructures gel; fix; high-aspect-ratio microstructures
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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MDPI and ACS Style

Chen, N.; Chen, X.; Xiong, P.; Hou, S.; Zhang, X.; Xiong, Y.; Liu, G.; Tian, Y. A New Method of Fixing High-Aspect-Ratio Microstructures by Gel. Micromachines 2016, 7, 115.

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