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Photomasks Fabrication Based on Optical Reduction for Microfluidic Applications
Department of Physics, University of Naples "Federico II", Via Cintia, 80128 Napoli, Italy
Institute for Microelectronics and Microsystems, Naples Unit, National Research Council, Via P. Castellino 111, 80131 Napoli, Italy
* Author to whom correspondence should be addressed.
Received: 16 March 2013; in revised form: 22 April 2013 / Accepted: 10 May 2013 / Published: 28 May 2013
Abstract: A procedure for fabrication of photomasks on photographic films with minimum feature achievable of about 20 μm, which are particularly suitable for the fast prototyping of microfluidic devices, has been improved. We used a commercial photographic enlarger in reverse mode obtaining 10:1 reduction factor with error less than 1%. Masks have been characterized by optical transmission measurement and contact profilometry: the exposed region completely absorbs light in the wavelength region explored, while the non-exposed region is transparent from 350 nm on; the average film thickness is of 410 nm and its roughness is about 120 nm. A PDMS microfluidic device has been realized and tested in order to prove the effectiveness of designed photomasks used with the common UV light box.
Keywords: microfluidic; optical reduction; photomasks
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Cite This Article
MDPI and ACS Style
Orabona, E.; Caliò, A.; Rendina, I.; Stefano, L.D.; Medugno, M. Photomasks Fabrication Based on Optical Reduction for Microfluidic Applications. Micromachines 2013, 4, 206-214.
Orabona E, Caliò A, Rendina I, Stefano LD, Medugno M. Photomasks Fabrication Based on Optical Reduction for Microfluidic Applications. Micromachines. 2013; 4(2):206-214.
Orabona, Emanuele; Caliò, Alessandro; Rendina, Ivo; Stefano, Luca D.; Medugno, Mario. 2013. "Photomasks Fabrication Based on Optical Reduction for Microfluidic Applications." Micromachines 4, no. 2: 206-214.