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Materials 2016, 9(7), 504; doi:10.3390/ma9070504

Incorporation of Rutin in Electrospun Pullulan/PVA Nanofibers for Novel UV-Resistant Properties

1
School of Textile and Material Engineering, Dalian Polytechnic University, Dalian 116034, China
2
College of Textiles, North Carolina State University, Raleigh, NC 27695, USA
*
Author to whom correspondence should be addressed.
Academic Editor: Nicole Zander
Received: 29 April 2016 / Revised: 10 June 2016 / Accepted: 14 June 2016 / Published: 23 June 2016
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Abstract

This study aimed to investigate the incorporation of rutin into electrospun pullulan and poly(vinyl alcohol) (PVA) nanofibers to obtain ultraviolet (UV)-resistant properties. The effect of weight ratios between pullulan and PVA, and the addition of rutin on the nanofibers’ morphology and diameters were studied and characterized by scanning electron microscopy (SEM). Fourier transform infrared (FTIR) analysis was utilized to investigate the interaction between pullulan and PVA, as well as with rutin. The results showed that the inclusion of PVA results in the increase in the fiber’s diameter. The addition of rutin had no obvious effect on the fibers’ average diameters when the content of rutin was less than 7.41%. FTIR results indicated that a hydrogen bond formed between pullulan and PVA, also between these polymers and rutin. Moreover, the addition of rutin could enhance the mechanical properties due to its stiff structure and could decrease the transmittance of UVA and UVB to be fewer than 5%; meanwhile, the value of ultraviolet protection factor (UPF) reached more than 40 and 50 when the content of rutin was 4.46% and 5.67%, respectively. Therefore, the electrospun pullulan/PVA/rutin nanofibrous mats showed excellent UV resistance and have potential applications in anti-ultraviolet packaging and dressing materials. View Full-Text
Keywords: pullulan; rutin; electrospinning; nanofiber; UV resistance pullulan; rutin; electrospinning; nanofiber; UV resistance
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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MDPI and ACS Style

Qian, Y.; Qi, M.; Zheng, L.; King, M.W.; Lv, L.; Ye, F. Incorporation of Rutin in Electrospun Pullulan/PVA Nanofibers for Novel UV-Resistant Properties. Materials 2016, 9, 504.

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