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Materials 2015, 8(1), 339-354; doi:10.3390/ma8010339

Simple Response Surface Methodology: Investigation on Advance Photocatalytic Oxidation of 4-Chlorophenoxyacetic Acid Using UV-Active ZnO Photocatalyst

Nanotechnology & Catalysis Research Center (NANOCAT), Institute of Postgraduate Studies, University of Malaya, 50603 Kuala Lumpur, Malaysia
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Academic Editor: Greta Ricarda Patzke
Received: 20 October 2014 / Revised: 21 November 2014 / Accepted: 1 December 2014 / Published: 19 January 2015
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Abstract

The performance of advance photocatalytic degradation of 4-chlorophenoxyacetic acid (4-CPA) strongly depends on photocatalyst dosage, initial concentration and initial pH. In the present study, a simple response surface methodology (RSM) was applied to investigate the interaction between these three independent factors. Thus, the photocatalytic degradation of 4-CPA in aqueous medium assisted by ultraviolet-active ZnO photocatalyst was systematically investigated. This study aims to determine the optimum processing parameters to maximize 4-CPA degradation. Based on the results obtained, it was found that a maximum of 91% of 4-CPA was successfully degraded under optimal conditions (0.02 g ZnO dosage, 20.00 mg/L of 4-CPA and pH 7.71). All the experimental data showed good agreement with the predicted results obtained from statistical analysis. View Full-Text
Keywords: zinc oxide; central composite design; response surface methodology; 4-chlorophenoxyacetic acid; photocatalytic degradation zinc oxide; central composite design; response surface methodology; 4-chlorophenoxyacetic acid; photocatalytic degradation
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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MDPI and ACS Style

Lee, K.M.; Hamid, S.B.A. Simple Response Surface Methodology: Investigation on Advance Photocatalytic Oxidation of 4-Chlorophenoxyacetic Acid Using UV-Active ZnO Photocatalyst. Materials 2015, 8, 339-354.

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