Materials 2013, 6(6), 2351-2359; doi:10.3390/ma6062351
Communication

Use of Amphoteric Copolymer Films as Sacrificial Layers for Constructing Free-Standing Layer-by-Layer Films

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Received: 21 May 2013; in revised form: 31 May 2013 / Accepted: 3 June 2013 / Published: 6 June 2013
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract: The present paper reports the use of an amphoteric copolymer, poly(diallylamine-co-maleic acid) (PDAMA), as a component of precursor layers (or sacrificial layers) for constructing free-standing layer-by-layer (LbL) films. A PDAMA-poly(styrenesulfonate) (PSS) film or PDAMA-poly(dimethyldiallylammonium chloride) (PDDA) film was coated on the surface of a quartz slide at pH 4.0 or 8.0, respectively, as a sacrificial layer that can be removed by changing the pH. The surface of the sacrificial layer was further covered with LbL films composed of poly(allylamine hydrochloride) (PAH) and PSS. The PAH-PSS films were released from the substrate upon immersing the film-coated quartz slide in acidic or neutral/basic solution, respectively, as a result of the pH-induced dissolution of the PDAMA-PDDA or PDAMA-PSS sacrificial layer. Thus, PDAMA-based sacrificial layers have been demonstrated to dissolve in both acidic and neutral solutions, depending on the type of counter polymer. The thicknesses of the sacrificial layers and released LbL films are crucial factors for constructing free-standing LbL films. The releasing kinetics also depended on the thickness of the crucial layers. The free-standing PAH-PSS films obtained were stable in water or in air in the dry state. PDAMA-based sacrificial layers may be useful in constructing free-standing LbL films containing biomolecules with limited pH stability.
Keywords: layer-by-layer film; amphoteric copolymer; free-standing LbL film; sacrificial layer; poly(diallylamine-co-maleic acid)
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MDPI and ACS Style

Wang, B.; Tokuda, Y.; Tomida, K.; Takahashi, S.; Sato, K.; Anzai, J.-I. Use of Amphoteric Copolymer Films as Sacrificial Layers for Constructing Free-Standing Layer-by-Layer Films. Materials 2013, 6, 2351-2359.

AMA Style

Wang B, Tokuda Y, Tomida K, Takahashi S, Sato K, Anzai J-I. Use of Amphoteric Copolymer Films as Sacrificial Layers for Constructing Free-Standing Layer-by-Layer Films. Materials. 2013; 6(6):2351-2359.

Chicago/Turabian Style

Wang, Baozhen; Tokuda, Yu; Tomida, Koji; Takahashi, Shigehiro; Sato, Katsuhiko; Anzai, Jun-ichi. 2013. "Use of Amphoteric Copolymer Films as Sacrificial Layers for Constructing Free-Standing Layer-by-Layer Films." Materials 6, no. 6: 2351-2359.

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