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Journal: Materials, 2012
Volume: 5
Page(s): 404-414

Article: Initial Processes of Atomic Layer Deposition of Al2O3 on InGaAs: Interface Formation Mechanisms and Impact on Metal-Insulator-Semiconductor Device Performance
Jevasuwan, W.; Urabe, Y.; Maeda, T.; Miyata, N.; Yasuda, T.; Yamada, H.; Hata, M.; Taoka, N.; Takenaka, M.; Takagi, S.

http://www.mdpi.com/1996-1944/5/3/404

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