Materials 2010, 3(12), 5283-5292; doi:10.3390/ma3125283
Article

Fabrication of Large Area Fishnet Optical Metamaterial Structures Operational at Near-IR Wavelengths

Department of Electrical and Computer Engineering, University of Delaware, Newark, DE 19716, USA
* Author to whom correspondence should be addressed.
Received: 2 November 2010; in revised form: 9 December 2010 / Accepted: 14 December 2010 / Published: 15 December 2010
(This article belongs to the Special Issue Next Wave of Metamaterials)
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Abstract: In this paper, we demonstrate a fabrication process for large area (2 mm × 2 mm) fishnet metamaterial structures for near IR wavelengths. This process involves: (a) defining a sacrificial Si template structure onto a quartz wafer using deep-UV lithography and a dry etching process (b) deposition of a stack of Au-SiO2-Au layers and (c) a ‘lift-off’ process which removes the sacrificial template structure to yield the fishnet structure. The fabrication steps in this process are compatible with today’s CMOS technology making it eminently well suited for batch fabrication. Also, depending on area of the exposure mask available for patterning the template structure, this fabrication process can potentially lead to optical metamaterials spanning across wafer-size areas.
Keywords: fishnet metamaterial; deep UV lithography; negative refraction; ‘lift-off’ process

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MDPI and ACS Style

Dutta, N.; Mirza, I.O.; Shi, S.; Prather, D.W. Fabrication of Large Area Fishnet Optical Metamaterial Structures Operational at Near-IR Wavelengths. Materials 2010, 3, 5283-5292.

AMA Style

Dutta N, Mirza IO, Shi S, Prather DW. Fabrication of Large Area Fishnet Optical Metamaterial Structures Operational at Near-IR Wavelengths. Materials. 2010; 3(12):5283-5292.

Chicago/Turabian Style

Dutta, Neilanjan; Mirza, Iftekhar O.; Shi, Shouyuan; Prather, Dennis W. 2010. "Fabrication of Large Area Fishnet Optical Metamaterial Structures Operational at Near-IR Wavelengths." Materials 3, no. 12: 5283-5292.

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