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Materials 2010, 3(12), 5283-5292; doi:10.3390/ma3125283

Fabrication of Large Area Fishnet Optical Metamaterial Structures Operational at Near-IR Wavelengths

Department of Electrical and Computer Engineering, University of Delaware, Newark, DE 19716, USA
Author to whom correspondence should be addressed.
Received: 2 November 2010 / Revised: 9 December 2010 / Accepted: 14 December 2010 / Published: 15 December 2010
(This article belongs to the Special Issue Next Wave of Metamaterials)
View Full-Text   |   Download PDF [374 KB, uploaded 15 December 2010]   |  


In this paper, we demonstrate a fabrication process for large area (2 mm × 2 mm) fishnet metamaterial structures for near IR wavelengths. This process involves: (a) defining a sacrificial Si template structure onto a quartz wafer using deep-UV lithography and a dry etching process (b) deposition of a stack of Au-SiO2-Au layers and (c) a ‘lift-off’ process which removes the sacrificial template structure to yield the fishnet structure. The fabrication steps in this process are compatible with today’s CMOS technology making it eminently well suited for batch fabrication. Also, depending on area of the exposure mask available for patterning the template structure, this fabrication process can potentially lead to optical metamaterials spanning across wafer-size areas. View Full-Text
Keywords: fishnet metamaterial; deep UV lithography; negative refraction; ‘lift-off’ process fishnet metamaterial; deep UV lithography; negative refraction; ‘lift-off’ process

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This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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MDPI and ACS Style

Dutta, N.; Mirza, I.O.; Shi, S.; Prather, D.W. Fabrication of Large Area Fishnet Optical Metamaterial Structures Operational at Near-IR Wavelengths. Materials 2010, 3, 5283-5292.

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