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Materials 2017, 10(2), 158; doi:10.3390/ma10020158

Study of Thermal Electrical Modified Etching for Glass and Its Application in Structure Etching

School of Aerospace Engineering, Xiamen University, 422th Siming South Road, Xiamen 351005, China
Author to whom correspondence should be addressed.
Received: 2 November 2016 / Accepted: 6 February 2017 / Published: 10 February 2017
(This article belongs to the Section Manufacturing Processes and Systems)
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In this work, an accelerating etching method for glass named thermal electrical modified etching (TEM etching) is investigated. Based on the identification of the effect in anodic bonding, a novel method for glass structure micromachining is proposed using TEM etching. To validate the method, TEM-etched glasses are prepared and their morphology is tested, revealing the feasibility of the new method for micro/nano structure micromachining. Furthermore, two kinds of edge effect in the TEM and etching processes are analyzed. Additionally, a parameter study of TEM etching involving transferred charge, applied pressure, and etching roughness is conducted to evaluate this method. The study shows that TEM etching is a promising manufacture method for glass with low process temperature, three-dimensional self-control ability, and low equipment requirement. View Full-Text
Keywords: thermal electrical modification; accelerating etching; multi-scale structures; glass thermal electrical modification; accelerating etching; multi-scale structures; glass

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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Zhan, Z.; Li, W.; Yu, L.; Wang, L.; Sun, D. Study of Thermal Electrical Modified Etching for Glass and Its Application in Structure Etching. Materials 2017, 10, 158.

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