The Microstructure of Nanocrystalline TiB2 Films Prepared by Chemical Vapor Deposition
AbstractNanocrystalline titanium diboride (TiB2) ceramics films were prepared on a high purity graphite substrate via chemical vapor deposition (CVD). The substrate was synthesized by a gas mixture of TiCl4, BCl3, and H2 under 1000 °C and 10 Pa. Properties and microstructures of TiB2 films were also examined. The as-deposited TiB2 films had a nano-sized grain structure and the grain size was around 60 nm, which was determined by X-ray diffraction, field emission scanning electron microscopy, and transmission electron microscopy. Further research found that a gas flow ratio of TiCl4/BCl3 had an influence on the film properties and microstructures. The analyzed results illustrated that the grain size of the TiB2 film obtained with a TiCl4/BCl3 gas flow ratio of 1, was larger than the grain size of the as-prepared TiB2 film prepared with a stoichiometric TiCl4/BCl3 gas flow ratio of 0.5. In addition, the films deposited faster at excessive TiCl4. However, under the condition of different TiCl4/BCl3 gas flow ratios, all of the as-prepared TiB2 films have a preferential orientation growth in the (100) direction. View Full-Text
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Huang, X.; Sun, S.; Tu, G.; Lu, S.; Li, K.; Zhu, X. The Microstructure of Nanocrystalline TiB2 Films Prepared by Chemical Vapor Deposition. Materials 2017, 10, 1425.
Huang X, Sun S, Tu G, Lu S, Li K, Zhu X. The Microstructure of Nanocrystalline TiB2 Films Prepared by Chemical Vapor Deposition. Materials. 2017; 10(12):1425.Chicago/Turabian Style
Huang, Xiaoxiao; Sun, Shuchen; Tu, Ganfeng; Lu, Shuaidan; Li, Kuanhe; Zhu, Xiaoping. 2017. "The Microstructure of Nanocrystalline TiB2 Films Prepared by Chemical Vapor Deposition." Materials 10, no. 12: 1425.
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