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Materials 2017, 10(12), 1425; doi:10.3390/ma10121425

The Microstructure of Nanocrystalline TiB2 Films Prepared by Chemical Vapor Deposition

School of Metallurgy, Northeastern University, No. 3-11, Wenhua Road, Heping District, Shenyang 110819, China
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Received: 7 November 2017 / Revised: 7 December 2017 / Accepted: 11 December 2017 / Published: 13 December 2017
(This article belongs to the Section Thin Films)
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Abstract

Nanocrystalline titanium diboride (TiB2) ceramics films were prepared on a high purity graphite substrate via chemical vapor deposition (CVD). The substrate was synthesized by a gas mixture of TiCl4, BCl3, and H2 under 1000 °C and 10 Pa. Properties and microstructures of TiB2 films were also examined. The as-deposited TiB2 films had a nano-sized grain structure and the grain size was around 60 nm, which was determined by X-ray diffraction, field emission scanning electron microscopy, and transmission electron microscopy. Further research found that a gas flow ratio of TiCl4/BCl3 had an influence on the film properties and microstructures. The analyzed results illustrated that the grain size of the TiB2 film obtained with a TiCl4/BCl3 gas flow ratio of 1, was larger than the grain size of the as-prepared TiB2 film prepared with a stoichiometric TiCl4/BCl3 gas flow ratio of 0.5. In addition, the films deposited faster at excessive TiCl4. However, under the condition of different TiCl4/BCl3 gas flow ratios, all of the as-prepared TiB2 films have a preferential orientation growth in the (100) direction. View Full-Text
Keywords: TiB2; nanocrystalline films; microstructure; chemical vapor deposition TiB2; nanocrystalline films; microstructure; chemical vapor deposition
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MDPI and ACS Style

Huang, X.; Sun, S.; Tu, G.; Lu, S.; Li, K.; Zhu, X. The Microstructure of Nanocrystalline TiB2 Films Prepared by Chemical Vapor Deposition. Materials 2017, 10, 1425.

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