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Sensors 2016, 16(10), 1628; doi:10.3390/s16101628

An Improved Manufacturing Approach for Discrete Silicon Microneedle Arrays with Tunable Height-Pitch Ratio

1,3,* , 2
and
2,*
1
Science and Technology on Electronic Test & Measurement Laboratory, North University of China, Taiyuan 030051, China
2
National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing 100871, China
3
Key Laboratory of Instrumentation Science & Dynamic Measurement, Ministry of Education, North University of China, Taiyuan 030051, China
*
Authors to whom correspondence should be addressed.
Academic Editor: Stefano Mariani
Received: 12 August 2016 / Revised: 2 September 2016 / Accepted: 18 September 2016 / Published: 9 October 2016
(This article belongs to the Collection Modeling, Testing and Reliability Issues in MEMS Engineering)
View Full-Text   |   Download PDF [1980 KB, uploaded 9 October 2016]   |  

Abstract

Silicon microneedle arrays (MNAs) have been widely studied due to their potential in various transdermal applications. However, discrete MNAs, as a preferred choice to fabricate flexible penetrating devices that could adapt curved and elastic tissue, are rarely reported. Furthermore, the reported discrete MNAs have disadvantages lying in uniformity and height-pitch ratio. Therefore, an improved technique is developed to manufacture discrete MNA with tunable height-pitch ratio, which involves KOH-dicing-KOH process. The detailed process is sketched and simulated to illustrate the formation of microneedles. Furthermore, the undercutting of convex mask in two KOH etching steps are mathematically analyzed, in order to reveal the relationship between etching depth and mask dimension. Subsequently, fabrication results demonstrate KOH-dicing-KOH process. {321} facet is figured out as the surface of octagonal pyramid microneedle. MNAs with diverse height and pitch are also presented to identify the versatility of this approach. At last, the metallization is realized via successive electroplating. View Full-Text
Keywords: discrete; microneedle; KOH etching; octagonal pyramid discrete; microneedle; KOH etching; octagonal pyramid
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Wang, R.; Wang, W.; Li, Z. An Improved Manufacturing Approach for Discrete Silicon Microneedle Arrays with Tunable Height-Pitch Ratio. Sensors 2016, 16, 1628.

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