Sensors 2013, 13(1), 865-874; doi:10.3390/s130100865
Article

Sensing Performance of Precisely Ordered TiO2 Nanowire Gas Sensors Fabricated by Electron-Beam Lithography

Wei-Cheng Tian 1,2,3,* email, Yu-Hsuan Ho 2 email, Chao-Hao Chen 2,3 email and Chun-Yen Kuo 3 email
1 Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan 2 Graduate Institute of Electronics Engineering, National Taiwan University, Taipei 10617, Taiwan 3 Graduate Institute of Biomedical Electronics and Bioinformatics, National Taiwan University, Taipei 10617, Taiwan
* Author to whom correspondence should be addressed.
Received: 7 November 2012; in revised form: 5 January 2013 / Accepted: 9 January 2013 / Published: 11 January 2013
(This article belongs to the Special Issue Gas Sensors - 2013)
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Abstract: In this study, electron beam lithography, rather than the most popular method, chemical synthesis, is used to construct periodical TiO2 nanowires for a gas sensor with both robust and rapid performance. The effects of temperature on the sensing response and reaction time are analyzed at various operation temperatures ranging from 200 to 350 °C. At the optimized temperature of 300 °C, the proposed sensor repeatedly obtained a rise/recovery time (ΔR: 0.9 R0 to 0.1 R0) of 3.2/17.5 s and a corresponding sensor response (ΔR/R0) of 21.7% at an ethanol injection mass quantity of 0.2 μg.
Keywords: temperature effect; TiO2 nanowire; gas sensors; electro-beam lithography

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MDPI and ACS Style

Tian, W.-C.; Ho, Y.-H.; Chen, C.-H.; Kuo, C.-Y. Sensing Performance of Precisely Ordered TiO2 Nanowire Gas Sensors Fabricated by Electron-Beam Lithography. Sensors 2013, 13, 865-874.

AMA Style

Tian W-C, Ho Y-H, Chen C-H, Kuo C-Y. Sensing Performance of Precisely Ordered TiO2 Nanowire Gas Sensors Fabricated by Electron-Beam Lithography. Sensors. 2013; 13(1):865-874.

Chicago/Turabian Style

Tian, Wei-Cheng; Ho, Yu-Hsuan; Chen, Chao-Hao; Kuo, Chun-Yen. 2013. "Sensing Performance of Precisely Ordered TiO2 Nanowire Gas Sensors Fabricated by Electron-Beam Lithography." Sensors 13, no. 1: 865-874.

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