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Sensors 2011, 11(7), 6719-6727; doi:10.3390/s110706719

DNA Strand Patterns on Aluminium Thin Films

1
Low Dimensional Material Research Centre, Department of Physics, University of Malaya, 50603, Kuala Lumpur, Malaysia
2
Department of Physics, Islamic Azad University, Qom Branch, Qom, Iran
3
Department of Genetics, Institute of Biological Sciences (ISB), University of Malaya, 50603, Kuala Lumpur, Malaysia
*
Authors to whom correspondence should be addressed.
Received: 10 May 2011 / Revised: 10 June 2011 / Accepted: 22 June 2011 / Published: 28 June 2011
(This article belongs to the Section Biosensors)
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Abstract

A new patterning method using Deoxyribose Nucleic Acid (DNA) strands capable of producing nanogaps of less than 100 nm is proposed and investigated in this work. DNA strands from Bosenbergia rotunda were used as the fundamental element in patterning DNA on thin films of aluminium (Al) metal without the need for any lithographic techniques. The DNA strands were applied in buffer solutions onto thin films of Al on silicon (Si) and the chemical interactions between the DNA strands and Al creates nanometer scale arbitrary patterning by direct transfer of the DNA strands onto the substrate. This simple and cost-effective method can be utilized in the fabrication of various components in electronic chips for microelectronics and Nano Electronic Mechanical System (NEMS) applications in general. View Full-Text
Keywords: DNA pattern; nano-gap; DNA strands; Al thin film; etching DNA pattern; nano-gap; DNA strands; Al thin film; etching
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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MDPI and ACS Style

Khatir, N.M.; Banihashemian, S.M.; Periasamy, V.; Abd Majid, W.H.; Rahman, S.A.; Shahhosseini, F. DNA Strand Patterns on Aluminium Thin Films. Sensors 2011, 11, 6719-6727.

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