Study on the XPS-ESCA of Aluminum Phosphide Products

doi:10.3390/i6030198

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Int. J. Mol. Sci. 2005, 6(3), 198-202; doi:10.3390/i6030198

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Study on the XPS-ESCA of Aluminum Phosphide Products

Canping Pan * , Weixi Li and Shuren Jiang

College of Applied Chemistry, China Agricultural University, Beijin 100094, China

* Author to whom correspondence should be addressed.

Received: 1 August 2004 / Accepted: 18 May 2005 / Published: 25 May 2005

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Abstract: XPS-ESCA analysis showed small signal for phosphorus in fresh specimens of aluminum phosphide (AlP). After removal of a layer of about 0.5 – 1.0 μm by argon ion sputtering, it was observed that signal intensities from oxygen and aluminum increased. The oxygen signal decreased as a function of sputtering time, synchronously with the increase of the phosphorous signal from the AlP nucleus. The aluminum signal, which was considered to be mainly due to AlP and Al(OH)₃, remained constant. Other impurity elements including N, Mg, etc., were identified in the technical 85% AlP and AlP tablet formulated products.

Keywords: XPS; ESCA; aluminum phosphide

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MDPI and ACS Style

Pan, C.; Li, W.; Jiang, S. Study on the XPS-ESCA of Aluminum Phosphide Products. Int. J. Mol. Sci. 2005, 6, 198-202.

AMA Style

Pan C., Li W., Jiang S. Study on the XPS-ESCA of Aluminum Phosphide Products. International Journal of Molecular Sciences. 2005; 6(3):198-202.

Chicago/Turabian Style

Pan, Canping; Li, Weixi; Jiang, Shuren. 2005. "Study on the XPS-ESCA of Aluminum Phosphide Products." Int. J. Mol. Sci. 6, no. 3: 198-202.

Int. J. Mol. Sci. EISSN 1422-0067 Published by MDPI Publishing, Basel, Switzerland RSS E-Mail Table of Contents Alert