Molecules 2016, 21(12), 1699; doi:10.3390/molecules21121699
Photostability and Performance of Polystyrene Films Containing 1,2,4-Triazole-3-thiol Ring System Schiff Bases
1
Department of Chemistry, College of Science, University of Al-Mustansiriyah, Baghdad 10052, Iraq
2
Cornea Research Chair, Department of Optometry, College of Applied Medical Sciences, King Saud University, P.O. Box 10219, Riyadh 11433, Saudi Arabia
3
College of Pharmacy, Privet Uruk University, Baghdad 10069, Iraq
4
Department of Chemistry, College of Science, Al-Nahrain University, Baghdad 64021, Iraq
*
Authors to whom correspondence should be addressed.
Academic Editor: Derek J. McPhee
Received: 5 November 2016 / Revised: 6 December 2016 / Accepted: 7 December 2016 / Published: 9 December 2016
Abstract
Series of 4-(4-substituted benzylideneamino)-5-(3,4,5-trimethoxyphenyl)-4H-1,2,4-triazole-3-thiols were synthesized and their structures were confirmed. The synthesized Schiff bases were used as photostabilizers for polystyrene against photodegradation. Polystyrene polymeric films containing synthesized Schiff bases (0.5% by weight) were irradiated (λmax = 365 nm and light intensity = 6.43 × 10−9 ein·dm−3·s−1) at room temperature. The photostabilization effect of 1,2,4-triazole-3-thiols Schiff bases was determined using various methods. All the additives used enhanced the photostability of polystyrene films against irradiation compared with the result obtained in the absence of Schiff base. The Schiff bases can act as photostabilizers for polystyrene through the direct absorption of UV radiation and/or radical scavengers. View Full-TextKeywords:
photostabilization; UV light; polystyrene; 1,2,4-triazole-3-thiol; functional group index; Schiff bases
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Ali, G.Q.; El-Hiti, G.A.; Tomi, I.H.R.; Haddad, R.; Al-Qaisi, A.J.; Yousif, E. Photostability and Performance of Polystyrene Films Containing 1,2,4-Triazole-3-thiol Ring System Schiff Bases. Molecules 2016, 21, 1699.
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