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A Facile One-Pot Process for the Formation of Hindered Tertiary Amines
Department of Pharmaceutics Engineering, Xihua University, Chengdu 610039, China
Natural Products Research Center, Chengdu Institute of Biology, Chinese Academy of Sciences, Chengdu 610041, China
* Authors to whom correspondence should be addressed.
Received: 4 April 2012; in revised form: 25 April 2012 / Accepted: 25 April 2012 / Published: 3 May 2012
Abstract: A simple and convenient method was developed for the preparation of hindered tertiary amines via direct reductive amination of ketones with secondary aryl amines, using trichlorosilane as reducing agent and tetramethylethylenediamine (TMEDA) as organic Lewis base activator. A broad range of ketones were reacted with N-methylaniline to afford the corresponding tertiary amine products in high yield. An open transition model was proposed for the reductive step.
Keywords: reductive amination; tertiary amine; Lewis base; trichlorosilane; ketone
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MDPI and ACS Style
Wang, Z.; Pei, D.; Zhang, Y.; Wang, C.; Sun, J. A Facile One-Pot Process for the Formation of Hindered Tertiary Amines. Molecules 2012, 17, 5151-5163.
Wang Z, Pei D, Zhang Y, Wang C, Sun J. A Facile One-Pot Process for the Formation of Hindered Tertiary Amines. Molecules. 2012; 17(5):5151-5163.
Wang, Zhouyu; Pei, Dong; Zhang, Yu; Wang, Chao; Sun, Jian. 2012. "A Facile One-Pot Process for the Formation of Hindered Tertiary Amines." Molecules 17, no. 5: 5151-5163.