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Molecules 2012, 17(5), 5151-5163; doi:10.3390/molecules17055151
Communication

A Facile One-Pot Process for the Formation of Hindered Tertiary Amines

1,* , 2, 2, 2 and 2,*
Received: 4 April 2012; in revised form: 25 April 2012 / Accepted: 25 April 2012 / Published: 3 May 2012
(This article belongs to the Section Organic Synthesis)
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Abstract: A simple and convenient method was developed for the preparation of hindered tertiary amines via direct reductive amination of ketones with secondary aryl amines, using trichlorosilane as reducing agent and tetramethylethylenediamine (TMEDA) as organic Lewis base activator. A broad range of ketones were reacted with N-methylaniline to afford the corresponding tertiary amine products in high yield. An open transition model was proposed for the reductive step.
Keywords: reductive amination; tertiary amine; Lewis base; trichlorosilane; ketone reductive amination; tertiary amine; Lewis base; trichlorosilane; ketone
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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MDPI and ACS Style

Wang, Z.; Pei, D.; Zhang, Y.; Wang, C.; Sun, J. A Facile One-Pot Process for the Formation of Hindered Tertiary Amines. Molecules 2012, 17, 5151-5163.

AMA Style

Wang Z, Pei D, Zhang Y, Wang C, Sun J. A Facile One-Pot Process for the Formation of Hindered Tertiary Amines. Molecules. 2012; 17(5):5151-5163.

Chicago/Turabian Style

Wang, Zhouyu; Pei, Dong; Zhang, Yu; Wang, Chao; Sun, Jian. 2012. "A Facile One-Pot Process for the Formation of Hindered Tertiary Amines." Molecules 17, no. 5: 5151-5163.


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