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Entropy 2016, 18(6), 226; doi:10.3390/e18060226

Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering

1
State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Xueyuan Road 30#, Beijing 100083, China
2
State Key Laboratory of Advanced Metallurgy, University of Science and Technology Beijing, Beijing 100083, China
3
Center for Condensed Matter and Materials Physics, Department of Physics, Beihang University, Beijing 100191, China
*
Author to whom correspondence should be addressed.
Academic Editor: An-Chou Yeh
Received: 30 April 2016 / Revised: 4 June 2016 / Accepted: 6 June 2016 / Published: 13 June 2016
(This article belongs to the Special Issue High-Entropy Alloys and High-Entropy-Related Materials)
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Abstract

High-entropy amorphous NbTiAlSiWxNy films (x = 0 or 1, i.e., NbTiAlSiNy and NbTiAlSiWNy) were prepared by magnetron sputtering method in the atmosphere of a mixture of N2 + Ar (N2 + Ar = 24 standard cubic centimeter per minute (sccm)), where N2 = 0, 4, and 8 sccm). All the as-deposited films present amorphous structures, which remain stable at 700 °C for over 24 h. After heat treatment at 1000 °C the films began to crystalize, and while the NbTiAlSiNy films (N2 = 4, 8 sccm) exhibit a face-centered cubic (FCC) structure, the NbTiAlSiW metallic films show a body-centered cubic (BCC) structure and then transit into a FCC structure composed of nanoscaled particles with increasing nitrogen flow rate. The hardness and modulus of the as-deposited NbTiAlSiNy films reach maximum values of 20.5 GPa and 206.8 GPa, respectively. For the as-deposited NbTiAlSiWNy films, both modulus and hardness increased to maximum values of 13.6 GPa and 154.4 GPa, respectively, and then decrease as the N2 flow rate is increased. Both films could be potential candidates for protective coatings at high temperature. View Full-Text
Keywords: high-entropy film; sputtering; nano-scaled particles; phase stability high-entropy film; sputtering; nano-scaled particles; phase stability
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Sheng, W.; Yang, X.; Wang, C.; Zhang, Y. Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering. Entropy 2016, 18, 226.

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